Suppression of Multilayer Graphene Patches during CVD Graphene growth on Copper

Zheng Han,Amina Kimouche,Adrien Allain,Hadi Arjmandi-Tash,Antoine Reserbat-Plantey,Sébastien Pairis,Valérie Reita,Nedjma Bendiab,Johann Coraux,Vincent Bouchiat
DOI: https://doi.org/10.48550/arXiv.1205.1337
2012-05-07
Mesoscale and Nanoscale Physics
Abstract:By limiting the carbon segregation at the copper surface defects, a pulsed chemical vapor deposition method for single layer graphene growth is shown to inhibit the formation of few-layer regions, leading to a fully single-layered graphene homogeneous at the centimeter scale. Graphene field-effect devices obtained after transfer of pulsed grown graphene on oxidized silicon exhibit mobilities above 5000 cm^2.V^-1.s^-1.
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