Ferroelectric Srbi2ta2o9-Sio2 Glass-Ceramic Thin Films in Metal/Ferroelectric/Insulator/Semiconductor Structures
D Wu,S Huang,QY Shao,AD Li,NB Ming
DOI: https://doi.org/10.1002/1521-396x(200209)193:1<r4::aid-pssa99994>3.0.co;2-e
2002-01-01
Abstract:physica status solidi (a)Volume 193, Issue 1 p. R4-R6 Rapid Research Note Ferroelectric SrBi2Ta2O9–SiO2 Glass-Ceramic Thin Films in Metal/Ferroelectric/Insulator/Semiconductor Structures Di Wu, Di Wu [email protected] National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorSu Huang, Su Huang National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorQiyue Shao, Qiyue Shao National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorAidong Li, Aidong Li National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorNaiben Ming, Naiben Ming National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this author Di Wu, Di Wu [email protected] National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorSu Huang, Su Huang National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorQiyue Shao, Qiyue Shao National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorAidong Li, Aidong Li National Laboratory of Solid State Microstructures and Department of Materials Science and Engineering, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this authorNaiben Ming, Naiben Ming National Laboratory of Solid State Microstructures and Department of Physics, Nanjing University, Nanjing 210093, P.R. ChinaSearch for more papers by this author First published: 01 October 2002 https://doi.org/10.1002/1521-396X(200209)193:13.0.CO;2-ECitations: 2AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat No abstract is available for this article. References [1] R. Ramesh, A. Inam, W.K. Chan, B. Wilkens, K. Myers, K. Remschnig, D.L. Hart, and J.M. Tarascon, Science 252, 944 (1991). [2] L.A. Bursill, I.M. Reaney, D.P. Vijay, and S.B. Desu, J. Appl. Phys. 75, 1521 (1994). [3] J.-P. Han and T.P. Ma, Appl. Phys. Lett. 72, 1185 (1998). [4] X. Wang and H. Ishiwara, Jpn. J. Appl. Phys. 40, 1401 (2001). [5] Q.Y. Shao, A.D. Li, H.Q. Ling, D. Wu, Y. Wang, Y. Feng, S.Z. Yang, Z.G. Liu, M. Wang, and N.B. Ming, in: Proc. 8th Internat. Conf. on Electronic Materials, Xi'an (China) 2002, to be published in Microelectron. Eng. [6] D.J. Taylor, R.E. Jones, P. Zurcher, P. Chu, Y.T. Lii, B. Jiang, and S.J. Gillespie, Appl. Phys. Lett. 68, 2300 (1996). [7] S.L. Miller and P.J. McWhorter, J. Appl. Phys. 72, 5999 (1992). [8] B.-E. Park and H. Ishiwara, Appl. Phys. Lett. 79, 806 (2001). [9] E.H. Nicollian and J.R. Brews, MOS (Metal Oxide Semiconductor) Physics and Technology, John Wiley & Sons, New York 1982. [10] D.S. Shin, H.N. Lee, Y.T. Kim, I.H. Choi, and B.H. Kim, Jpn. J. Appl. Phys. 37, 4373 (1998). [11] K. Saegusa, J. Am. Ceram. Soc. 79, 3282 (1996). Citing Literature Volume193, Issue1September 2002Pages R4-R6 ReferencesRelatedInformation