Progress in Research on Wide Band-Gap Semiconductor SiC and Its Application

王玉霞,何海平,汤洪高
DOI: https://doi.org/10.3321/j.issn:0454-5648.2002.03.021
2002-01-01
Abstract:Due to its excellent physical and chemical properties, SiC has been regarded as a key material for the third_generation semiconductors with extensive potential applications. In this paper, SiC properties, techniques for SiC bulk and film growth, current status of research on SiC_based device, and applications and prospect of SiC materials are reviewed. The aothors' results of growing single_crystalline 4H-SiC film on Si substrate by pulsed laser deposition are also described.
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