The effect of pressure on the properties of germanium and silicon

William Paul
DOI: https://doi.org/10.1016/0022-3697(59)90315-4
IF: 4.383
1959-01-01
Journal of Physics and Chemistry of Solids
Abstract:Measurements of the pressure dependence, in germanium and silicon, of the intrinsic resistivity, the fundamental absorption edge, the carrier mobilities, the magnetoresistance coefficients, and the dielectric constant are reviewed, and an explanation based on the shift of the band edges presented. Experimental evidence for similar behavior of corresponding band extrema in germanium, silicon and the intermetallics is given. The cases of the (111) and (100) minima in germanium and silicon and the Ge-Si alloys are discussed in detail. The results of measurements of the change of ionization energy of shallow and deep lying impurity levels in germanium and silicon are also reviewed.
physics, condensed matter,chemistry, multidisciplinary
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