Recent Progress of Gr/Si Schottky Photodetectors

Qingguo Shao,Hao Qi,Chao Li,Kunpeng Cai,Jianxia Dong,Xuhui Liu,Ning Cao,Xiaobei Zang
DOI: https://doi.org/10.1007/s13391-022-00384-2
IF: 3.151
2022-11-11
Electronic Materials Letters
Abstract:By combing the carrier mobility of graphene with the excellent light absorption properties of silicon, ultra-shallow Schottky junction can be obtained, and can exist stably for a long time. The photoelectric property of Schottky junction is determined not only by graphene and silicon semiconductor layer, but also by the interface layer between the two. Through a series of optimizations, the performance of graphene/silicon Schottky junction photodetectors can be continuously improved. As a result, graphene/silicon Schottky junctions more promising for the development of next generation photodetectors with its stability, ease of preparation and sensitivity. In this review, we firstly give a brief introduction to Gr Schottky junction photodetectors, and then present a comprehensive review on the recent progress of optimizing Gr/Si Schottky junction photodetectors in the past few years, including light management engineering, band engineering and interfacial engineering. Finally, the current challenges are summarized and further perspectives are outlined. Graphical
materials science, multidisciplinary
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