Cost-Effective Co-Optimization of RF Process Technology Targeting Performances/Power/Area Enhancements for RF and mmWave Applications

Sutae Kim,Hyungjin Lee,Yongchae Jeong
DOI: https://doi.org/10.3390/electronics13132513
IF: 2.9
2024-06-27
Electronics
Abstract:In this paper, we propose a cost-effective way to tune RF process technology to achieve well-optimized RF and mmWave performances/power/area by tweaking back-end-of-line (BEOL) configurations. This paper suggests that the most favorable altitude is that of an ultra-thick-metal (UTM) layer from the silicon substrate, and the effort also focuses on the calibration of the via height/pitch underneath the UTM to satisfy the least ohmic loss in the interface between the active and passive device components. We implemented a process optimization in a 28 nm fully depleted silicon-on-insulator (FD-SOI) process technology, and the results show performance enhancements on the inductor, achieving a 14.8% quality factor improvement and a 13.1% self-resonance frequency improvement. This paper also showcases how the process optimization boosts 29 GHz LNA performances, with a 31.8% gain in boosting and a 9.1% reduction in noise-figure.
engineering, electrical & electronic,physics, applied,computer science, information systems
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