Development of moisture-proof polydimethylsiloxane/aluminum oxide film and stability improvement of perovskite solar cells using the film

Eun Young Choi,Ju-Hee Kim,Bu-Jong Kim,Ji Hun Jang,Jincheol Kim,Nochang Park
DOI: https://doi.org/10.1039/C9RA01107B
IF: 4.036
2019-10-07
RSC Advances
Abstract:A method for enhancing the moisture barrier property of polydimethylsiloxane (PDMS) polymer films is proposed. This is achieved by filling the PDMS free volume with aluminum oxide (AlO x ). To deposit AlO x inside PDMS, thermal atomic layer deposition (ALD) is employed. The PDMS/AlO x film thus produced has a 30 nm AlO x layer on the surface. Its water vapor transmission rate (WVTR) is 5.1 × 10 −3 g m −2 d −1 at 45 °C and 65% relative humidity (RH). The activation energy of permeability with the PDMS/AlO x film for moisture permeation is determined to be 35.5 kJ mol −1 . To investigate the moisture barrier capability of the PDMS/AlO x layer, (FAPbI 3 ) 0.85 (MAPbBr 3 ) 0.15 /spiro-OMeTAD/Au perovskite solar cells are fabricated, and encapsulated by the PDMS/AlO x film. To minimize the thermal damage to solar cells during ALD, AlO x deposition is performed at 95 °C. The solar cells exposed to 45 °C-65% RH for 300 h demonstrate less than a 5% drop in the power-conversion efficiency.
chemistry, multidisciplinary
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