Enhanced mechanical, thermal and electrical properties of high‐entropy HfMoNbTaTiVWZr thin film metallic glass and its nitrides

Sajid Alvi,Michal Milczarek,Dariusz M. Jarzabek,Daniel Hedman,Mojtaba Gilzad Kohan,Neonila Levintant-Zayonts,Alberto Vomiero,Farid Akhtar
DOI: https://doi.org/10.1002/adem.202101626
IF: 3.6
2022-05-06
Advanced Engineering Materials
Abstract:The inception of high‐entropy alloy promises to push the boundaries for new alloy design with unprecedented properties. This work reports entropy stabilization of an octonary refractory, HfMoNbTaTiVWZr, high‐entropy thin film metallic glass, and derived nitride films. The thin film metallic glass exhibited exceptional ductility of ∽60% strain without fracture and compression strength of 3 GPa in micro‐compression, due to the presence of high density and strength of bonds. The thin film metallic glass shows thermal stability up to 750 oC and resistance to Ar‐ion irradiation. Nitriding during film deposition of HfMoNbTaTiVWZr thin film of strong nitride forming refractory elements results in deposition of nanocrystalline nitride films with compressive strength, hardness, and thermal stability of up to 10 GPa, 18.7 GPa, and 950 oC, respectively. The high amount of lattice distortion in the nitride films leads to its insulating behaviour with electrical conductivity as low as 200 S/cm in the as‐deposited film and decreases to negligible values after heat treatment. The design and exceptional properties of the thin film metallic glass and derived nitride films may open up new avenues of development of bulk metallic glasses and the application of refractory‐based high entropy thin films in structural and functional applications. This article is protected by copyright. All rights reserved.
materials science, multidisciplinary
What problem does this paper attempt to address?