P-silicon Thin Film Fabricated by Magnetron Sputtering and Aluminium Induced Crystallization for Schottky Silicon Solar Cells
Omid Shekoofa,Jian Wang,Dejie Li,Yi Luo,Changzheng Sun,Zhibiao Hao,Yanjun Han,Bing Xiong,Lai Wang,Hongtao Li
DOI: https://doi.org/10.1016/j.mssp.2017.06.008
IF: 4.1
2017-01-01
Materials Science in Semiconductor Processing
Abstract:Solar cells consist of n-Si wafer and p-Si polycrystalline thin film, which was solely fabricated by magnetron sputtering, and aluminium induced crystallization, are presented in this paper. Firstly, the material and electrical properties of the fabricated p-Si thin films including the crystallization ratio, grain size, morphology, carrier density and mobility were studied by Raman spectroscopy, X-ray diffraction (XRD), scanning electron microscopy and Hall Effect measurement, respectively. The p-Si polycrystalline thin film formed under optimal process conditions had the crystallization ratio of ~ 99% and the grain size of ~ 64.6nm, determined from the data of Raman spectroscopy and XRD. The hole concentration in the fabricated p-Si polycrystalline thin films was mainly in the order of 1017cm−3 to 1019cm−3, and their corresponding mobility values ranged from 15cm2/Vs to 65cm2/Vs. Then solar cells with the device structure of Al electrode/n-Si wafer/p-Si thin film/Al electrode were fabricated, and their electrical properties were measured both under dark and illumination conditions by the semiconductor performance tester and solar simulator. The measured J-V curves under dark condition confirmed the creation of a p-n junction with the ideality factor of 1.55, rectification ratio of 410 at ± 1V, and the reverse saturation current of 246nA/cm2. The efficiency of 2.19%, with an open circuit voltage of 448mV and a short circuit current density of 11.2mA/cm2, was achieved under AM1.5G standard illuminations.