Abstract:We present a combined study based on experimental measurements of infrared (IR) dielectric function and first-principles calculations of IR spectra and vibrational density of states (VDOS) of amorphous alumina (am-Al$_2$O$_3$). In particular, we show that the main features of the imaginary part of the dielectric function $\epsilon_2(\omega)$ at $\sim$380 and 630 cm$^{-1}$ are related to the motions of threefold coordinated oxygen atoms, which are the vast majority of oxygen atoms in am-Al$_2$O$_3$. Our analysis provides an alternative point of view with respect to an earlier suggested assignment of the vibrational modes, which relates them to the stretching and bending vibrational modes of AlO$_{n}$ ($n=$ 4, 5, and 6) polyhedra. Our assignment is based on the additive decomposition of the VDOS and $\epsilon_2(\omega)$ spectra, which shows that: (i) the band at $\sim$380 cm$^{-1}$ features oxygen motions occurring in a direction normal to the plane defined by the three nearest-neighbor aluminum atoms, i.e. out-of-plane motions of oxygen atoms; (ii) Al--O stretching vibrations (i.e. in-plane motions of oxygen atoms) appear at frequencies above $\sim$500 cm$^{-1}$, which characterize the vibrational modes underlying the band at $\sim$630 cm$^{-1}$. Aluminum and fourfold coordinated oxygen atoms contribute uniformly to the VDOS and $\epsilon_2(\omega)$ spectra in the frequency region $\sim$350--650 cm$^{-1}$ without causing specific features. Our numerical results are in good agreement with the previous and presently obtained experimental data on the IR dielectric function of am-Al$_2$O$_3$ films. Finally, we show that the IR spectrum can be modeled by assuming isotropic Born charges for aluminum atoms and fourfold coordinated oxygen atoms, while requiring the use of three parameters, defined in a local reference frame, for the anisotropic Born charges of threefold coordinated oxygen atoms.

Atomic-Layer-Deposited Aluminum Oxide Thin Films Probed with X-ray Scattering and Compared to Molecular Dynamics and Density Functional Theory Models

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

The Microstructure, Morphology, and Mechanical Properties of Sol-Gel-derived Amorphous Aluminum Oxide Films

Thickness Dependence of the Physical Properties of Atomic-Layer Deposited Al2O3

Shrunk Lattice Structure and Interdiffusion Characteristics of 5 Nm Thick Al(2)O(3) Ultrathin Films Sputtered on Silicon.

Experimentally informed structure optimization of amorphous TiO2 films grown by atomic layer deposition

Formation mechanism and photoelectric properties of Al2O3 film based on atomic layer deposition

Atomic and electronic structure of amorphous Al–Zr alloy films

Formation and growth kinetics of the initial amorphous oxide film on the aluminum melt: A ReaxFF molecular dynamics simulation

Infrared spectra in amorphous alumina: a combined ab initio and experimental study

Comparative study of the growth of sputtered aluminum oxide films on organic and inorganic substrates

Electronic, Magnetic and Vibrational Properties of Single Layer Aluminum Oxide

Infrared Spectroscopy Studies of Aluminum Oxide and Metallic Aluminum Powders, Part I: Thermal Dehydration and Decomposition

Cryo-ePDF: Overcoming Electron Beam Damage to Study the Local Atomic Structure of Amorphous ALD Aluminum Oxide Thin Films within a TEM

A Comprehensive Study of Al2O3 Mechanical Behavior Using Density Functional Theory and Molecular Dynamics

Ab initio structure modeling of complex thin-film oxides: thermodynamical stability of TiC/thin-film alumina

Structural and Nanochemical Properties of AlOx Layers in $Al/AlO_x/Al$-Layer Systems for Josephson Junctions

The Impact of Thickness and Thermal Annealing on Refractive Index for Aluminum Oxide Thin Films Deposited by Atomic Layer Deposition

Effect of hydrogen on the chemical state, stoichiometry and density of amorphous Al2O3 films grown by thermal atomic layer deposition

The initial oxidation of poly-crystalline aluminum studied with x-ray photoelectron spectroscopy

Vibrational and thermal properties of amorphous alumina from first principles