Effect of substrate polishing on the growth of graphene on 3C–SiC(111)/Si(111) by high temperature annealing

B Gupta,I Di Bernardo,P Mondelli,A Della Pia,M G Betti,F Iacopi,C Mariani,N Motta
DOI: https://doi.org/10.1088/0957-4484/27/18/185601
IF: 3.5
2016-03-21
Nanotechnology
Abstract:We analyse the effects of substrate polishing and of the epilayer thickness on the quality of graphene layers grown by high temperature annealing on 3C-SiC(111)/Si(111) by scanning tunnelling microscopy, x-ray photoelectron spectroscopy, Raman spectroscopy, low energy electron diffraction and high resolution angle resolved photoemission spectroscopy. The results provide a comprehensive set of data confirming the superior quality of the graphene layers obtained on polished substrates, and the limitations of the growth obtained on unpolished surfaces.
materials science, multidisciplinary,physics, applied,nanoscience & nanotechnology
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