Hybrid simulation of radio frequency biased inductively coupled Ar/O 2 /Cl 2 plasmas
Tong Lei,Zhao Ming-Liang,Zhang Yu-Ru,Song Yuan-Hong,Wang You-Nian,
DOI: https://doi.org/10.7498/aps.73.20231369
IF: 0.906
2024-01-01
Acta Physica Sinica
Abstract:In the etching process, a bias source is usually applied to the substrate of the inductively coupled plasma (ICP) to realize independent modulation of the ion energy and ion flux. In this work, a hybrid model, i.e., a global model combined bi-directionally with a fluid sheath model, is employed to investigate the plasma properties and ion energy distribution function (IEDF) in biased inductively coupled Ar/O 2 /Cl 2 plasmas. The results indicated that at the bias frequency of 2.26 MHz, the densities of Cl - and ClO + ions first increase with bias voltage, and then they decrease, and finally they rise again, which is different from the densities of other charged species, O and Cl atoms. At the bias frequency of 13.56 MHz and 27.12 MHz, except Cl - and Cl 2 + ions, the evolution of other species densities with bias voltage is similar to the results at lower bias frequency. The evolution of the species densities with bias frequency depends on the bias voltage. For instance, in the low bias voltage range ( 300 V), except Cl 2 + and Cl - ions, the densities of other charged species, O and Cl atoms first decrease with bias frequency and then they increase due to a decrease and then an increase in the heating of the plasma by the bias source. In addition, as the bias frequency increases, the peak separation of IEDF becomes narrow, the high energy peak and low energy peak approach each other and they almost merge into one peak at high bias frequency. The results obtained in this work are of significant importance for improving the etching process.
physics, multidisciplinary