A high entropy silicide by reactive spark plasma sintering

Yuan Qin,Ji-Xuan Liu,Fei Li,Xiaofeng Wei,Houzheng Wu,Guo-Jun Zhang
DOI: https://doi.org/10.1007/s40145-019-0319-3
IF: 11.534
2019-03-01
Journal of Advanced Ceramics
Abstract:A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive spectrometer analysis except a small amount of zirconium that is combined with oxygen as impurity particles. The Young’s modulus, Poisson’s ratio, and Vickers hardness of the obtained (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 are also measured.
materials science, ceramics
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