Abstract:Operating conditions strongly affect the yield and quality of polysilicon in a polysilicon fluidized bed. In this study, a new model of polysilicon fluidized bed was established using the Euler–Euler model coupled with population balance model (PBM), which was combined with fluid flow, heat, and mass transfer models, while considering the scavenging effect of silicon fines. The effects of different operating conditions on the deposition and formation rates of silicon fines were investigated. Results show that the model can correctly describe the particle growth process in the fluidized bed of polysilicon. The silicon fines and the interphase velocity difference show “N”- and “M”-shaped distributions along the axial direction, respectively. The particle temperature and concentration near the wall are higher than those in the central region. The decomposition of silane in the bottom region of the bed is dominated by heterogeneous deposition. The scavenging of silicon fines occurs in the dilute-phase region. The effects of operating conditions, i.e. inlet gas temperature, silane composition, and gas velocity, on the reactor performance were also explored comprehensively. Increasing the inlet gas composition and velocity enhances the formation rates of solid silicon and fines. Increasing the inlet gas temperature promotes the growth of solid silicon and inhibits the formation of silicon fines. High fluidization ratio, low inlet silane concentration, and high inlet gas temperature enhance the selectivity of silicon growth.

Heat and mass transfer characteristics of three-dimensional bell-shaped polysilicon chemical vapor deposition reactor

Local Heat and Mass Transfer Characteristics of Different Channel Configurations in Polysilicon Chemical Vapor Deposition Reactor

Simulation of Heat Transfer in a Vertical Tubular CVD Reactor

Development of a polysilicon chemical vapor deposition reactor using the computational fluid dynamics method

CFD-Aided Design for Polysilicon Production System

Silane Pyrolysis to Silicon Rod in A Bell-Jar Reactor at High Temperature and Pressure: Modeling and Simulation

International Conference on Applied Energy – ICAE 2016 Improvement of Heat and Mass Transfer Performance in a Polysilicon Chemical Vapor Deposition Reactor with Field Synergy Principle L

Numerical and experimental study of polysilicon deposition on silicon tubes

A transport-kinetic model development for polysilicon chemical vapor deposition in a SiHCl3–H2 system

Numerical Analysis of the Chemical Vapor Deposition of Polysilicon in a Trichlorosilane and Hydrogen System

MD Simulation and Transport Property Analysis of Silicon in High-Temperature Molten Fluoride Salts Electrolyte

Numerical Solution for Radiative Heat Transfer in a Novel Polysilicon CVD Reactor

A Revisit from CVD Kinetics to CVD Reactor: Investigating Uniform Growth Mechanism of Polysilicon in a Reduction Furnace

Numerical Simulation of Multiple Polysilicon Cvd Reactors Connected in Series Using Cfd Method

Optimization of Operating Parameters in Polysilicon Chemical Vapor Deposition Reactor with Response Surface Methodology

Investigation of heat transfer mechanism affecting temperature homogeneity at polysilicon rods in a Siemens reduction furnace

CFD Simulation of the Hydrodynamic Behavior in an Internally Circulating Fluidized Bed Reactor for Producing Polysilicon Granules

Simulation of temperature profile and design of heat transfer structure for reactor of film growth on Si-wafer

Numerical simulation of granular silicon growth and silicon fines formation process in polysilicon fluidized bed

A Hot-Wall Tubular Reactor for Silane Pyrolysis: Modeling and Simulation

Chemical Vapor Deposition Of Silicon In A Lamp-Heated Reactor - Effects Of Heat Absorption, Emission, And Conduction