Preparation, Structural, and Physical Properties of Nanocrystalline Silicon, Germanium, and Diamond Nanocrystals, Films, and Nanowires *

Sergio Pizzini
DOI: https://doi.org/10.1201/9780429328206-3
2020-05-11
Abstract:Nanocrystals, nanocrystalline films, and nanowires of group IV semiconductors have been, and still are, a matter of relevant fundamental and technological research interest, which is devoted to materials that in their bulk phases are at the origin of the development of semiconductor physics and of modern microelectronics. The aim of this chapter is to give a comprehensive view of the role of the process chemistries and temperatures in the morphological, structural, and physical properties of these semiconductors at the nano-size, with relevant attention on the effect of metals used as catalysts and of the gaseous precursors. Major concern will be given to nanocrystalline silicon films and nanowires, in view of their quantum confinement potentialities, which could offer to silicon optoelectronic applications forbidden in its bulk phase. It will be shown that chemical surface contaminations or the presence of amorphous phases at the surface play a critical role in the properties of these nanomaterials, and that the set-up of phase transitions induced by surface strain does also occur in the case of silicon nanowires. It will be, in fact, shown that size-induced strain is involved in the stabilization of the hexagonal structure of silicon nanowires when their diameter is below a critical value. This chapter provides a comprehensive view of the role of the process chemistries and temperatures in the morphological, structural, and physical properties of these semiconductors at the nano-size, with relevant attention on the effect of metals used as catalysts and of the gaseous precursors. Colloidal silicon nanocrystals and silicon quantum dots belong to a vast family of colloidal nanocrystals suitably dispersed in a liquid supporting medium. During the thermal annealing, the nanocrystal size increases with time, associated with the decrease of the amorphous silicon mass, and a-Si begins to behave as a capping layer of Si-nanocrystals. Significant topological differences are presented by metal-assisted and Metal-assisted chemical etching-grown Si nanowires (NWs). Raman spectroscopy is used as a direct probe of phonon confinement in Si NWs, just in the same way as in the cases of dots and of nanocrystalline silicon.
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