Back Surface Recombination Velocity Dependent of Absorption Coefficient as Applied to Determine Base Optimum Thickness of an n+/p/p+ Silicon Solar Cell

Mint Sidi Dede Meimouna,Lamine Ba Mamadou,Amadou Ba Mamour,Ndiaye Mor,Gueye Sega,Hadj Sow El,Diatta Ibrahima,Samba Diop Masse,Wade Mamadou,Sissoko Gregoire,Meimouna Mint Sidi Dede,Mamadou Lamine Ba,Mamour Amadou Ba,Mor Ndiaye,Sega Gueye,El Hadj Sow,Ibrahima Diatta,Masse Samba Diop,Mamadou Wade,Gregoire Sissoko
DOI: https://doi.org/10.4236/epe.2020.127027
2020-01-01
Energy and Power Engineering
Abstract:The monochromatic absorption coefficient of silicon, inducing the light penetration depth into the base of the solar cell, is used to determine the optimum thickness necessary for the production of a large photocurrent. The absorption-generation-diffusion and recombination (bulk and surface) phenomena are taken into account in the excess minority carrier continuity equation. The solution of this equation gives the photocurrent according to ab sorption and electronic parameters. Then from the obtained short circuit photocurrent expression, excess minority carrier back surface recombination velocity is determined, function of the monochromatic absorption coefficient at a given wavelength. This latter plotted versus base thickness yields the optimum thickness of an n + -p-p + solar cell, for each wavelength, which is in the range close to the energy band gap of the silicon material. This study provides a tool for improvement solar cell manufacture processes, through the mathematical relationship obtained from the thickness limit according to the absorption coefficient that allows base width optimization.
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