Improvising the Switching Ratio through Low-k / High-k Spacer and Dielectric Gate Stack in 3D FinFET - a Simulation Perspective

Asharani Samal,Kumar Prasannajit Pradhan,Sushanta Kumar Mohapatra

DOI: https://doi.org/10.1007/s12633-020-00618-8

IF: 3.4

2020-08-03

Silicon

Abstract:This paper extensively studies the spacer technology, including low-k/high-k, single/dual dielectrics on the device performances focusing on the leakage current. The tactical use of a spacer, introduction of a low bandgap material as a pocket on the source side along with the incorporation of gate dielectrics helped in improving the switching ratio effectively. A systematic comparison is made in between the conventional symmetrical single low-k spacer 3D FinFET and the proposed optimized 3D FinFET. Various device architectures are evaluated by showing significant improvements in on current (Ion) and off state leakage (Ioff), leading to a high switching ratio (Ion/Ioff) and the subthreshold slope (SS). An Ion/Ioff of value 1 × 106 indicates sufficient electrostatics to control over the channel, and our study results in ~8 time of this value. These parameters are obtained after the appropriate selection of low-k & high-k spacer length on both sides of the source and drain. The use of SiGe material near the source side to modulate carrier mobility and incorporating high-k gate dielectric to suppress leakage.

materials science, multidisciplinary,chemistry, physical