Abstract:Electrochromic niobia (Nb205) coatings were prepared by the sot-gel spin-coating and d.c. magnetron sputtering techniques. Parameters were investigated for the process fabrication of sol-gel spin coated Nb205 films exhibiting high coloration efficiency comparable with that d.c. magnetron sputtered niobia films. X-ray diffraction studies (XRD) showed that the sot-gel deposited and magnetron sputtered films heat treated at temperatures below 450°C, were amorphous, whereas those heat treated at higher temperatures were slightly crystalline. X-ray photoelectron spectroscopy (XPS) studies showed that the stoichiometry of the films was Nb205. The refractive index and electrochromic coloration were found to depend on the preparation technique. Both films showed low absorption and high transparency in the visible range. We found that the n, k values of the sot-gel deposited films to be lower than for the sputtered films. The n and k values were n = 1.82 and k = 3 × 10−3, and n = 2.28 and k = 4 × 10−3 at 530 urn for sot-gel deposited and sputtered films, respectively. The electrochemical behavior and structural changes were investigated in 1 M LiC104/propylene carbonate solution. Using the electrochemical measurements and X-ray photoelectron spectroscopy, the probable electrode reaction with the lithiation and delithiation is Nb2O5 + x Li+ + x e− ↔ LixNb205. Cyclic voltametric (CV) measurements showed that both Nb205 films exhibits electrochemical reversibility beyond 1200 cycles without change in performance. “In situ” optical measurement revealed that those films exhibit an electrochromic effect in the spectral range 300 < λ < 2100 nm but remain unchanged in the infrared spectral range. The change in visible transmittance was 40% for 250 nm thick electrodes. Spectroelectrochemical measurements showed that spin coated films were essentially electrochemically equivalent to those prepared by d.c. magnetron sputter deposition.

Selection of synthesis parameters for niobium pentaoxide films by oxidation in phosphoric acid solution.

SYNTHESIS OF NANOSIZED NIOBIUM PENTOXIDE FILMS FOR CREATING A CRYOGENIC GYROSCOPE ROTOR

Electrochemical Synthesis of Crystalline Niobium Oxide

Large amplitude voltage oscillations during plasma electrolytic oxidation (PEO) of niobium and their correlation with the porous morphology

Anodic nanoporous niobium oxide layers grown in pure molten ortho-phosphoric acid

Low-temperature synthesis of niobium oxide nanoparticles from peroxo niobic acid sol.

Synthesis of niobium pentoxide from bis(cyclopentadienyl) niobium(IV) dichloride using the spin coating process

Nb2O5 and AlNbO4 coatings formed by plasma electrolytic oxidation of niobium: synthesis, characterization, and photocatalytic activity

Growth and process conditions of aligned and patternable films of iron(III) oxide nanowires by thermal oxidation of iron.

Electrochemical and Electrochromic Properties of Niobium Oxide Thin Films Fabricated by Pulsed Laser Deposition

Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate

Influence of the electrical parameters of the anodizing PEO process on wear and corrosion resistance of niobium

Porous Films on Surface of Titanium Prepared by Low Voltage Micro Arc Oxidation

Facile Synthesis and Unique Photocatalytic Property of Niobium Pentoxide Hollow Spheres and the High Optoelectronic Performance of Their Nanofilm.

Composition Regulation of Potassium Sodium Niobate Thin Films Through Post-Annealing under Alkali Element Atmospheres

Preparation and Characterization of Highly Oriented NiO(200) Films by a Pulse Ultrasonic Spray Pyrolysis Method

Calcium and phosphorous enrichment of porous niobium and titanium oxides for biomaterial applications

Anodic oxidation of titanium in phosphoric acid baths: Phosphorus incorporation into the oxide

Alkali Niobate Powder Synthesis Using an Emerging Microwave-Assisted Hydrothermal Method

Studies on the electrochemical deposition of niobium oxide

Optical and electrochemical characteristics of niobium oxide films prepared by sol-gel process and magnetron sputtering A comparison