Boost Organic‐Silicon Hybrid Solar Cell Performances with a Facile and Cost‐effective Sub‐3 nm Interface Control Method

Yi Yang,Dan Su,Nan-Xi Jin,Fenghua Liu,Xiao-Yang Zhang,Peng Xia,Yuan-Jun Song,Huan-Li Zhou,Weiping Wu,Tong Zhang
DOI: https://doi.org/10.1002/solr.202300627
IF: 9.1726
2023-09-27
Solar RRL
Abstract:A facile and cost‐effective approach based on oxygen plasma treatment is developed for silicon‐organic hybrid solar cells. By precisely forming a sub‐3 nm SiOx layer at the Si‐PEDOT:PSS interface with a 10 seconds oxygen plasma treatment, we boosted the power conversion efficiency (PCE) from 0.02% to 8.18%, 409‐fold increase compared to solar cells with untreated silicon. Utilizing X‐ray photoelectron spectroscopy (XPS), Kelvin Probe Force Microscopy (KPFM) and density functional theory (DFT), we revealed the device physics and mechanisms from an atomic‐level perspective. The control of interface by oxygen plasma treatment reduces the surface work function of Si and introduces an electron barrier, facilitating the transfer of hole carriers from Si to organic materials while effectively blocking electron transmission. This mechanism proves to be highly beneficial in mitigating carrier recombination and promoting the separation of electrons and holes. Our approach can be applied to interface optimization for high performance photovoltaic and other optoelectronic devices. This article is protected by copyright. All rights reserved.
energy & fuels,materials science, multidisciplinary
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