Abstract:In this work, the fabrication of the nanoimprinted titanium dioxide (TiO 2 ) gratings via thermal nanoimprinting lithography method (T-NIL) and its visible light response are studied. A polydimethylsiloxane (PDMS) primary mould, which in turn made via pattern transfer of micro/nano tracks present in the optical discs is used in T-NIL process. A transparent TiO 2 film on a FTO substrate was subjected to pattern transfer from the PDMS mould. The imprinted TiO 2 was post annealed to obtain anatase phase. The optical properties and photo response behaviour of plain and nanoimprinted TiO 2 films were measured and compared. Raman spectroscopy measurements indicated the surface enhanced Raman scattering in imprinted samples. The imprinted TiO 2 showed reduced reflectance compared to plain TiO 2 films due to the increased light path length because of multiple reflections leading to in coupling of light. Photo response was observed under visible light illumination conditions, wherein imprinted TiO 2 films showed appreciable photocurrent, which is otherwise very minimal in plain TiO 2 . The visible light photosensing in imprinted TiO 2 occur due to the oxygen adsorption-desorption during the post deposition annealing and under illumination respectively. This work makes use of low-cost PDMS primary mould and T-NIL at favourable temperature and pressure conditions with a promising outlook for fabricating imprinted TiO 2 with photo sensing ability and adaptability for large area upscaling.

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