Alpha spectrometric characterization of thin $^{233}$U sources for $^{229\text{(m)}}$Th production

Raphael Haas,Michelle Hufnagel,Roman Abrosimov,Christoph E. Düllmann,Dominik Krupp,Christoph Mokry,Dennis Renisch,Jörg Runke,Ulrich W. Scherer
DOI: https://doi.org/10.48550/arXiv.2004.02571
2020-04-06
Instrumentation and Detectors
Abstract:Four different techniques were applied for the production of $^{233}$U alpha recoil ion sources, providing $^{229}$Th ions. They were compared with respect to a minimum energy spread of the $^{229}$Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting $^{228}$Th recoil ions from $^{232}$U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
What problem does this paper attempt to address?