Design Points of InGaAs MFMIS Tunnel FET for Large Memory Window and Stable Ferroelectric Memory Operation

Kyul Ko,Dae-Hwan Ahn,Jai-Youn Jeong,Byeong-Kwon Ju,Jae-Hoon Han
DOI: https://doi.org/10.1109/ted.2024.3449255
IF: 3.1
2024-09-28
IEEE Transactions on Electron Devices
Abstract:We study device structures and their design points of -based InGaAs metal-ferroelectric–metal-insulator–semiconductor (MFMIS) ferroelectric tunnel FETs (Fe-TFETs) based on ferroelectric (FE) polarization-controlled band-to-band tunneling (BTBT) for stable nonvolatile memory (NVM) operation. We monolithically integrated a MFM capacitor into the baseline tunnel field-effect transistor (TFET), which has steep subthreshold swing (SS) characteristics of sub-60 mV/decade with a HfO2/Al2O3 gate-stack, compared to the reference MOSFET. We found temperature-stable NVM behaviors of the InGaAs Fe-TFET compared to the InGaAs ferroelectric MOSFETs (Fe-MOSFETs) at the measurement temperature range from -20 °C to 85 °C. Furthermore, we explored the scaling effects of the MFMIS structure using a high- HfO2 gate insulator layer to pursue a steep SS, and a large capacitance ratio between the dielectric (DE) and FE capacitors. The InGaAs MFMIS-structure Fe-TFET achieves stable retention over 104 s and excellent endurance during 106 cycles at the DE/FE capacitance ratio of 27.5.
engineering, electrical & electronic,physics, applied
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