A Finite-Element Model for Underpotential Deposition of Ce(III) on an Active Aluminum Electrode in LiCl–KCl Melts
Meng Zhang,Bo Liang,Junhan Luo,Mingjian He,Weibing Wang,Yang Yang,Yu Zhou,Liman Chen,Caishan Jiao
DOI: https://doi.org/10.1149/1945-7111/ac6221
IF: 3.9
2022-04-01
Journal of The Electrochemical Society
Abstract:Underpotential deposition on an active Al cathode plays an increasingly important role in pyroprocessing of used nuclear fuel, but most of the developed models are applied to simulate underpotential deposition at atomic level without considering electron transfer process which is a critical step in electrochemical reactions. In this work, a novel finite-element model for the underpotential deposition of Ce(III) in LiCl–KCl melts is developed with the consideration of Ce(III) activity in the Al electrode and the electron transfer process which is described by Butler-Volmer equation. This model was applied to investigate cyclic voltammetry(CV), square wave voltammetry(SWV) and electrodeposition behaviors of Ce(III) on an Al/Mo electrode. Additionally, the effect of temperature and electrode surface area on the electrodeposition thickness was investigated. Simulated CV and SWV curves are obtained and compared with our pervious experimental data. The results also provide the distribution diagrams of current density, electrostatic potential, Ce(III) concentration and electrodeposition thickness. Furthermore, the electrodeposition thickness is found to be linearly proportional to temperature and the inverse of cathode’s area, respectively. This work proposes a new pathway for the further study of underpotential deposition process.
electrochemistry,materials science, coatings & films