Fostering Charge Carrier Transport and Absorber Growth Properties in CZTSSe Thin Films with an ALD-SnO 2 Capping Layer

Kuldeep Singh Gour,Pravin S. Pawar,Minwoo Lee,Vijay C. Karade,Jae Sung Yun,Jaeyeong Heo,Jongsung Park,Jae Ho Yun,Jin Hyeok Kim
DOI: https://doi.org/10.1021/acsami.4c02432
IF: 9.5
2024-05-31
ACS Applied Materials & Interfaces
Abstract:The present study demonstrates that precursor passivation is an effective approach for improving the crystallization process and controlling the detrimental defect density in high-efficiency Cu(2)ZnSn(S,Se)(4) (CZTSSe) thin films. It is achieved by applying the atomic layer deposition (ALD) of the tin oxide (ALD-SnO(2)) capping layer onto the precursor (Cu-Zn-Sn) thin films. The ALD-SnO(2) capping layer was observed to facilitate the homogeneous growth of crystalline grains and mitigate defects...
materials science, multidisciplinary,nanoscience & nanotechnology
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