Regulating the Dispersion of CuO over SiO2 Surface for Selective Oxidation of Isobutane to Tert-Butanol

Renjie Ji,Ning Li,Jiale Xu,Rui Huang,Xiaoyu Yan,Xiuyi Li,Yuhan Sun,Chunyi Li

DOI: https://doi.org/10.1016/j.jcis.2024.11.119

IF: 9.9

2024-01-01

Journal of Colloid and Interface Science

Abstract:Controlling the highly selective oxidation of CH bonds in alkanes was still a challenge in the oxidation process, especially in oxygen atmospheres. Herein, three CuO/SiO2 catalysts were designed and prepared by regulating the introduction of copper species to achieve the selective oxidation of tertiary CH of isobutane (i-C4H10) to tert-butanol (TBA). Under the condition of 130 °C and 1.5 h, CuO/SiO2-DP catalyst could achieve 92.7 % O2 conversion and 85.1 % TBA selectivity, and the cycle stability could be maintained. The improvement of catalytic performance could be attributed to the efficient utilization of Cu atoms, which was related to the regulating the formation of copper phyllosilicate and the full utilization of Si-OH on the surface of SiO2 during the catalyst synthesis process. Copper phyllosilicate formed a rich Si-O-Cu unit, enhanced the metal oxide-support interaction, inhibited the growth of copper species, improved the anchoring and dispersion of CuO, and ultimately improved the accessibility of substrate molecules on active CuO (111). In addition, the adsorption configuration of i-C4H10 and O2 on CuO (111) was determined by in-situ FT-IR and DFT, and the existence form of O2 after charge transfer was discussed. The reaction mechanism of i-C4H10 oxidation to TBA was revealed, which provided theoretical guidance for the selective preparation of TBA from i-C4H10 over metal oxides.