Dual-Wavelength Ultra-Stable Laser Operating at 780 Nm and 852 Nm

Tong Shen,Jiyang Ma,Xiaobo Xue,Yani Zuo,Weinan Zhao,Yabei Su,Zhiyang Wang,Honglei Yang,Tiantian Shi,Yige Lin,Jingbiao Chen,Shengkang Zhang
DOI: https://doi.org/10.1109/eftf61992.2024.10722632
2024-01-01
Abstract:We employed the Pound-Drever-Hall technique to independently stabilize the frequencies of two 780 nm semiconductor lasers and two 852 nm semiconductor lasers to 5 cm cube Fabry-Pérot optical cavities, with the finesse measured to be above $2.0\times 10^{5}$ across the wavelengths from 780 nm to 852 nm. By comparing the two similar laser systems, we determined that each system exhibited a fractional frequency instability of $4.0\times 10^{-15}/1\mathrm{s}$ at 780 nm and $4.2\times 10^{-15}/1\mathrm{s}$ at 852 nm, respectively. The linewidth of each system is 2.5 Hz. This ultra-stable laser system can be used for precise spectroscopic measurements of clock lines of rubidium and cesium atoms.
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