Robust Topological Insulating Property in C2X-functionalized III-V Monolayers

Xianghong Xue,Zhihua Lin,Rui Gao,Bingzhuo Yang,Haoyu Wang,Mengmeng Han,Nannan Han
DOI: https://doi.org/10.1088/1361-6528/ad8098
IF: 3.5
2024-01-01
Nanotechnology
Abstract:Two-dimensional topological insulators (TIs) show great potential applications in low-power quantum computing and spintronics due to the spin-polarized gapless edge states. However, the small bandgap limits their room-temperature applications. Based on first-principles calculations, a series of C2X (X = H, F, Cl, Br and I) functionalized III-V monolayers are investigated. The nontrivial bandgaps of GaBi-(C2X)2, InBi-(C2X)2, TlBi-(C2X)2and TlSb-(C2X)2are found to between 0.223 and 0.807 eV. For GaBi-(C2X)2and InBi-(C2X)2, the topological insulating properties originate from thes-px,yband inversion induced by the spin-orbital coupling (SOC) effect. While for TlBi-(C2X)2and TlSb-(C2X)2, the topological insulating properties are attributed to the SOC effect-induced band splitting. The robust topological characteristics are further confirmed by topological invariantsZ2and the test under biaxial strain. Finally, two ideal substrates are predicted to promote the applications of these TIs. These findings indicate that GaBi-(C2X)2, InBi-(C2X)2, TlBi-(C2X)2and TlSb-(C2X)2monolayers are good candidates for the fabrication of spintronic devices.
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