Abstract:The guiding pattern in the chemoepitaxially directed self-assembly (DSA) of block copolymers is often fabricated by periodically functionalizing homogeneously random copolymer brushes tethered on a substrate. The prepatterned copolymer brushes constitute a soft penetrable surface, and their two components can in principle locally segregate in response to the overlying self-assembly process of block copolymers. To reveal how the self-responsive behavior of the copolymer brushes affects the directing effect, we develop a dissipative particle dynamics model to explicitly include the prepatterned polymer brushes and implement it to simulate the DSA of a cylinder-forming diblock copolymer melt on the sparse pattern of polymer brushes. Through large-scale dynamic simulations, we identify the windows of the content of the random copolymer, the film thickness, and the diameter of the patterned spot, for the formation of perfectly ordered hexagonal patterns composed of perpendicular cylinders. Our dynamic simulations reveal that the random copolymer brushes grafted on the unpatterned area exhibit a remarkable self-responsive ability with respect to the self-assembly of the diblock copolymers overlying them, which may widen the effective window of the content of the random copolymer. Within the processing windows of these key parameters, defect-free patterns are successfully achieved both in simulations and in experiments with sizes as large as a few micrometers for 4-fold density multiplications. This work demonstrates that highly efficient computer simulations based on an effective model can provide helpful guidance for experiments to optimize the critical parameters and even may promote the application of DSA.

Self-Brushing Block Copolymers for Defect Self-Healing in Directed Self-Assembly

Controlling Block Copolymer–Substrate Interactions by Homopolymer Brushes/Mats

Boundary-Directed Epitaxy of Block Copolymers

Directed Self-Assembly of Ternary Blends of Block Copolymer and Homopolymers on Chemical Patterns

Controlled Grafting of Well-Defined Polymers on Hydrogen-Terminated Silicon Substrates by Surface-Initiated Atom Transfer Radical Polymerization

Directed Self-Assembly by Sparsely Prepatterned Substrates with Self-Responsive Polymer Brushes.

Self-brushing for nanopatterning: achieving perpendicular domain orientation in block copolymer thin films

Tunable Assembly of Block Copolymer Tethered Particle Brushes by Surface-Initiated Atom Transfer Radical Polymerization

A Facile Method of Forming Nanoscale Patterns on Poly(ethylene Glycol)-Based Surfaces by Self-Assembly of Randomly Grafted Block Copolymer Brushes.

Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers

Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending

Surface Coassembly of Binary Mixed Polymer Brushes and Linear Block Copolymer Chains.

Directed Self-Assembly of Triblock Copolymer on Chemical Patterns for Sub-10-nm Nanofabrication via Solvent Annealing

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat

Tuning PDMS brush chemistry by UV-O3 exposure for PS-b-PDMS microphase separation and directed self-assembly

Directed self-assembly of block copolymers by chemical or topographical guiding patterns: Optimizing molecular architecture, thin-film properties, and kinetics

Directed Block Copolymer Self-Assembly Implemented Via Surface-Embedded Electrets

Post-directed-self-assembly Membrane Fabrication for in Situ Analysis of Block Copolymer Structures

Optimization of Intrinsic Self-Healing Silicone Coatings by Benzotriazole Loaded Mesoporous Silica

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Sequential Self-Assembly of Polystyrene- block-Polydimethylsiloxane for 3D Nanopatterning via Solvent Annealing