Excellent Energy Storage Performance in BSFCZ/AGO/BNTN Double-Heterojunction Capacitors Via the Synergistic Effect of Interface and Dead-Layer Engineering

Li Ren,Kaixin Guo,Ruirui Cui,Xu Wang,Min Zhang,Chaoyong Deng
DOI: https://doi.org/10.1016/j.nanoen.2024.110065
IF: 17.6
2024-01-01
Nano Energy
Abstract:Dielectric films with ultra-high energy storage density and efficiency are urgently needed due to the energy crisis. Here, we construct novel ferroelectric/dead-layer/superparaelectric (FE/DL/SPE) double-heterojunction capacitors, utilizing interface and dead-layer engineering to achieve outstanding energy storage performance. Bi0.9Sm0.1Fe0.9Co0.05Zn O-0.05(3) (BSFCZ) with large polarization, Ba0.985Na0.015Ti0.95Ni0.05O3 (BNTN) with low hysteresis and high breakdown strength (E-b), and artificial Al0.9Ga0.1O3 (AGO) with wide band-gap were chosen as the FE, SPE, and DL phases, respectively. Interface engineering enables the BSFCZ/AGO/BNTN films to maintain a high polarization of 55 mu C cm(-2), while the linear dielectric AGO and SPE BNTN substantially suppresses the remnant polarization. This can be clarified by the evolution of domains in the BSFCZ layer: nano-domains are scaled down to polar clusters, reducing polarization hysteresis while maintaining relatively high polarization. Simultaneously, two opposing intrinsic electric fields are formed to offset a portion of the external electric field, and the low dielectric constant AGO layer bears a significant part of the applied electric field due to electromagnetic boundary conditions. Consequently, the E b is significantly increased from 4.4 MV cm(-1) of BSFCZ/BNTN to 5.5 MV cm(-1) of BSFCZ/AGO/BNTN, resulting in a giant recoverable energy density of 132 J cm(-3) and a high efficiency of 84 % in BSFCZ/AGO/BNTN films. Moreover, the BSFCZ/AGO/BNTN films excel in temperature stability (RT similar to 200 degrees C), fatigue resistance (up to 107 7 cycles), and frequency stability (200 Hz to 20 kHz), alongside an exceptionally rapid discharge rate of 2.6 mu s. This innovative approach suggests new possibilities for producing environmentally friendly, large-area, high-performance dielectric capacitors.
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