Patterning: Atomic‐Level Sculpting of Crystalline Oxides: Toward Bulk Nanofabrication with Single Atomic Plane Precision (small 44/2015)

Stephen Jesse,Qian He,Andrew R. Lupini,Donovan N. Leonard,Mark P. Oxley,Oleg Ovchinnikov,Raymond R. Unocic,Alexander Tselev,Miguel Fuentes‐Cabrera,Bobby G. Sumpter,Stephen J. Pennycook,Sergei V. Kalinin,Albina Y. Borisevich
DOI: https://doi.org/10.1002/smll.201570264
IF: 13.3
2015-01-01
Small
Abstract:On page 5895, Q. He, A. Y. Borisevich, and co-workers describe how an aberration-corrected e-beam in a scanning transmission electron microscope can be used to crystallize amorphous complex oxides with atomic plane precision. Using this control system, epitaxial growth of SrTiO3 is achieved to pattern text onto a 90 × 25 nm area, as shown in the image. Each feature shown is about 20 unit cells (about 8 nm) wide.
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