Infrared and Terahertz Modulation Characteristics of N-Gebi/p-si Photodiodes

Dainan Zhang,Jin Li,Yulong Liao,Yang Liu,Tianlong Wen
DOI: https://doi.org/10.1109/ted.2016.2626467
2017-01-01
Abstract:In this paper, germanium-bismuth (Ge1-xBix, x = 0-0.32) is grown by low-temperature molecular beam epitaxy. Because Bi is an element belonging to group V, GeBi films show inherent n-type doping properties compared with GeSn ones. Inherent n-type Ge1-xBix films with a doping concentration of 2 × 1015-2 × 1016/cm3 are epitaxially deposited on p-type Si substrates to form p-n junctions. Current-voltage measurements show that the dark current density of the diodes can approach 0.32 A/cm2. The influence of Bi concentration on the infrared (IR) and terahertz (THz) transmittance of the films is investigated. Near-IR (1-2 μm) and mid/far-IR (2.6-10 μm) responsivities of the films are 0.65 and 0.032 A/W, respectively. The THz wave transmittance is tuned by -6%-8% by tailoring the bias voltage. A modulation depth of -12% is obtained for a Ge0.78Bi0.22/p-Si diode. The dynamic modulation characteristics of n-Ge1-xBix/ p-Si diodes are further investigated using a 340-GHz carrier. The experimental maximum THz wave modulation speed is up to 2 MHz. The present results demonstrate that n-GeBi/ p-Si diodes are promising for both mid/far-IR photodetectors and broadband high-speed THz wave modulators.
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