21St CIRP Conference on Life Cycle Engineering Material and Energy Efficiency Analysis of Low Pressure Chemical Vapor Deposition of TiO 2 Film

Fenfen Wang,Nanjing Zhu,Tao Li,Hongchao Zhang
2014-01-01
Abstract:In this paper, Low Pressure Chemical Vapor Deposition (LPCVD) of TiO2 thin film process is chosen as the research object to study the material and energy consumptions in this process. The material and energy utilization efficiencies have been calculated and compared under f ive different reaction conditions (623K, 500Pa; 673K, 500Pa; 723K, 500Pa; 673K, 400Pa; 673K, 300Pa). The material utilization efficiency result reveals that the material utilization in this process is rather low (less 1% in each condition) and increases with higher temperature and lo wer pressure. The energy analysis result shows th at the energy efficiency is extremely low (less 0.1% in each condition) and increases with decreasing temperature and increasing pressure. The reaction condition (623K, 500Pa) is regarded as a satisfactory condition with the highest en ergy efficiency (0.083%) in spite of the lowest material utilization efficiency (0.5%). This research can lay a foundation for the future opt imization work to improve the sustainability performance of LPCVD preparing thin films. © 2014 The Authors. Published by Elsevier B.V. Selection and peer-review under responsibility of the International Scientific Committee of the 21st CIRP Conference on Life Cycle En gineering in the person of the Conference Chair Prof. Terje K. Lien.
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