Abstract:Vanadium dioxide (VO2) film with nanoparticles is fabricated by reactive ion beam deposition (RIBD) technology and post-annealing method on a quartz glass substrate. RIBD can enhance the damage threshold of VO2 film and reduce its scattering at insulator-state. And post-annealing can eliminate the structure defects and residual stress. VO2 film exhibits first-order and reversible metal-to-insulator (MIT) phase transition at a temperature of 68 ℃. It also exhibits photo-induced MIT, in which process a metal-like phase of monoclinic VO2 appears. With many surprising features in heat-induced and photo-induced MIT processes, VO2 film turn to satisfy all the characteristics needed for a laser protection system. The thickness of VO2 film used in these experiments and simulations is about 100 nm. The double-frequency He-Ne laser at a wavelength of 3 m is used to perform the experiment of heat-induced MIT, with a temperature controlling system. The exact optimal annealing temperature is demonstrated to be 465 ℃, as the sample annealing at this temperature shows the sharpest transition properties and unmixed VO2 phase peaks in X-ray diffraction pattern. Drude and Drude-Lorentz dispersion models are taken to analyze the dielectric constant of VO2. Then, the complex refractive index is calculated for simulation. Simulations with the TFCale software show that the transmissions at high temperature and low temperature have high contrasts in the infrared range. MIT experiments at multi-wavelength, which cover heat-induced and photo-induced MIT phase transition, are performed to investigate the applicability of VO2 film in multi-wavelength laser protection for both continuous wave and pulsed lasers Thus the excellent performance of VO2 film for laser protection is roundly verified. The laser protection experiments on silicon photocell exhibit that the VO2 film enhances the anti-jamming capability of photocell system by about 2.6 times, demonstrating the applicability of VO2 film to laser protection system. The power density of MIT transition threshold of VO2 film with a thickness of 100 nm is 4.35 W/cm2 at room temperature, which is investigated with a continuous wave laser at a wavelength of 1.08 m with a continuous tunable system. In addition, atomic force microscope is used to observe the film surfaces, which are irradiated by lasers with different power densities for different times The experimental results demonstrate that the power density damage threshold of VO2 film becomes very high (404 W/cm2). The low MIT transition threshold and high damage threshold of VO2 film further demonstrate its applicability as a key role for a laser protection system. With the high switching efficiency ratio and high damage threshold, VO2 thin film can be used in optical switch, smart windows and photoelectric device.

Self‐Excited Free‐Standing VO2 Film for Infrared Optical Limiter

Thermal-stimulated Phase Transition of Vanadium Dioxide Enabling Versatile Transduction and Smart Applications

Ultra‐High Transmission Broadband Tunable VO2 Optical Limiter

Infrared Laser Protection of Multi-Wavelength with High Optical Switching Efficiency Vo2 Film

Limiting optical diodes enabled by the phase transition of vanadium dioxide

Ultrathin broadband reflective optical limiter

Optical switching properties of VO2 films driven by using WDM-aligned lasers

Reflective Optical Limiters: Ultrathin Broadband Reflective Optical Limiter (laser Photonics Rev. 15(6)/2021)

Self-excited vanadium dioxide film and its prevention of laser interference infrared thermal imaging

On the Optical Properties of Thin‐Film Vanadium Dioxide from the Visible to the Far Infrared

Electrically tunable VO 2 –metal metasurface for mid-infrared switching, limiting and nonlinear isolation

Dimension-Controlled VO2 Film for Optoelectronic Logic Gates and Information Encryption.

Low Temperature Fabrication of High-Performance VO2 Film Via Embedding Low Vanadium Buffer Layer

Broadband Planar Multilayered Absorbers Tuned by VO2 Phase Transition

Adaptive Tuning of Infrared Emission Using VO2 Thin Films

A reflective mm-wave photonic limiter

Current-modulated Optical Properties of Vanadium Dioxide Thin Films in the Phase Transition Region

Electrically tunable VO2-metal metasurface for mid-infrared switching, limiting, and nonlinear isolation

High Infrared Reflectance Modulation in VO2 Films Synthesized on Glass and ITO coated Glass substrates using Atmospheric Oxidation of Vanadium

Cooperative Thermal-Electric Field Control of Infrared Modulation Using a Vanadium Dioxide Film-Based Modulator

Heat accumulation and phase transition induction in a VO2 thin film by a femtosecond pulse-periodic radiation