Synthesis and characterization of Sm(DPM)3 used as precursor for MOCVD
Yinzhu Jiang,Haizheng Song,Ling Li,Weitao Bao,Guangyao Meng
DOI: https://doi.org/10.1016/j.jcrysgro.2004.03.029
IF: 1.8
2004-01-01
Journal of Crystal Growth
Abstract:High pure Sm(DPM)3 (DPM=2,2,6,6-tetramethyl-3,5-heptanedionato) powder was successfully synthesized from Sm(NO3)3 and HDPM in ethanol/aqueous solution followed by reduced pressure distillation and recrystallization from toluene. This metal β-diketonate complex used as precursor for metal-organic chemical vapor deposition (MOCVD) of Sm2O3 film has been characterized by elemental analyses, 1H-NMR spectroscopy, thermogravimetry-differential thermal analysis (TG-DTA analysis), infrared spectroscopy and mass spectroscopic analysis. The thermal decomposition behavior of the complex is sensitive to the ambient gases and Sm(DPM)3 is sufficiently stable after it being exposed to air for 30 days. The chemical bonds in the complex are decomposed in the sequence of C–O>SmO>C–C(CH3)3>C–C and C–H at elevated temperatures. At 400°C this complex thoroughly converts into Sm2O3 and Sm2(CO3)3 in air. The decomposition mechanism may be somewhat different at different operation conditions.