Germanium doping for improved silicon substrates and devices
J. Vanhellemont,J. Chen,J. Lauwaert,H. Vrielinck,W. Xu,D. Yang,J.M. Rafí,H. Ohyama,E. Simoen
DOI: https://doi.org/10.1016/j.jcrysgro.2010.11.024
IF: 1.8
2011-01-01
Journal of Crystal Growth
Abstract:During the last decade, the 300mm silicon wafer has been optimized and one is studying the move to 450mm crystals and wafers. The ever increasing silicon crystal diameter leads to two important trends with respect to substrate characteristics: the interstitial oxygen concentration decreases while the size of grown in voids and crystal originated particles (COPs) in vacancy-rich crystals is increasing.