Studies of the Mechanism of Electrical Conduction in As-doped ZnO by Structural and Chemical-Bonding Analyses and First Principle Calculations

Yuehong Shen,Lan Mi,Xiaojun Xu,Jiada Wu,Pei-Nan Wang,Ying Zhang,Ning Xu
DOI: https://doi.org/10.1016/j.ssc.2008.09.003
IF: 1.934
2008-01-01
Solid State Communications
Abstract:X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and first-principle density-functional theory (DFT) calculations are carried out on the p-type As-doped ZnO (ZnO:As) films prepared by pulsed laser deposition (PLD). XRD results indicate that defects are induced by As incorporation in ZnO lattice structure. The XPS analyses demonstrate that As atoms locate Zn-sites in ZnO:As films. Based on XRD and XPS results, it can be suggested that some forms of AsZn (As occupies Zn site) related complexes construct acceptors. First-principle density-functional calculations can show the electronic structures of several possible AsZn-related complexes in ZnO:As. The calculation results show that an AsZn–2V Zn (an As atom occupies a Zn site and induces two nearby Zn vacancies) complex can be a shallow acceptor in ZnO.
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