Retained Dose Analysis for Nitrogen Plasma Based Ion Implantation of Square-Shaped Titanium Sample

Xia Li
IF: 1.8
2003-01-01
Materials Science and Technology
Abstract:Dose analysis of nitrogen plasma based ion implantation (PBII) of a square-shaped titanium sample was carried out by AES sputter depth profiling, which took into account the influence of titanium oxide and solvesd the overlap problem, and converted AES data in to a concentration depth profile to acquire the retained dose in the substrate. The results measured at different positions on the square-shaped sample showed that, the shape of the target has a significant influence on the retained dose and causes a retained dose distribution on the sample surface. The thickness of the titanium oxide increases with the increasing retained dose.
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