Low-damage Photolithography for Magnetically Doped (bi,sb)2te3 Quantum Anomalous Hall Thin Films

Zhiting Gao,Minghua Guo,Zichen Lian,Yaoxin Li,Yunhe Bai,Xiao Feng,Ke He,Yayu Wang,Chang Liu,Jinsong Zhang
DOI: https://doi.org/10.1088/1674-1056/ad0147
2023-01-01
Chinese Physics B
Abstract:We have developed a low-damage photolithography method for magnetically doped (Bi,Sb)(2)Te-3 quantum anomalous Hall (QAH) thin films incorporating an additional resist layer of poly(methyl methacrylate) (PMMA). By performing control experiments on the transport properties of five devices at varied gate voltages (V (g)s), we revealed that the modified photolithography method enables fabricating QAH devices with the transport and magnetic properties unaffected by fabrication process. Our experiment represents a step towards the production of novel micro-structured electronic devices based on the dissipationless QAH chiral edge states.
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