Abstract:Boron doping can change the basic properties of diamond coatings prepared by the hot filament chemical vapor deposition (HFCVD) method, including residual stress, coating-substrate adhesion and wear resistance. However, the specific effect of boron doping level on the properties of diamond coatings and the mechanism needs further investigation. In the present study, the tungsten cemented carbide (WC-Co) material is selected as the substrate to deposit boron-doped diamond coatings with different doping levels ranging from 0 to 15,000 ppm. To elaborate the influences of doping level on the boron-doped diamond (BDD) coatings, microstructure, surface roughness, grain orientation, nanohardness, Raman spectral, Kernel Average Misorientation (KAM) and Rockwell indentation of diamond coatings are characterized, then friction tests and milling experiments are conducted on all specimens. The results indicate that the appropriate doping level of 8000 ppm can change the grain orientation to (110) orientation, guarantee diamond quality and hardness, reduce the residual stress, minimize the coefficients of friction (COF) and improve the tool life. Raman and KAM analysis demonstrate that the specimen generates suitable tensile stress in the diamond lattice and offsets the compressive stress of the coating to obtain the lowest residual stress and the highest coating-substrate adhesion strength. Friction test results illustrate that the specimen has the best wear resistance because the grain with (110) orientation has high hardness and low COF. In addition, milling experiments illustrate that the specimen has the best machining life due to the combination of good coating-substrate adhesion and wear resistance, with a tool life of 355 min, which is 29.6 % longer than the machining life of the undoped diamond coated tool.

Effect of Substrate Temperature on Diamond Film on Boronized WC–6%Co Substrate

Effects of Chemical Surface Pretreatments on Diamond Coatings on Cemented Tungsten Carbide Substrate

Effect of Deposition Temperature on Properties of Boron-Doped Diamond Films on Tungsten Carbide Substrate

Influence on the Performance of CVD Diamond Films by Boronizing on Smooth Cobalt-cemented Tungsten Carbide

Deposition of Diamond Films on Smooth Surfaces of Cemented Carbide Inserts with Cobalt Boride Interlayers

Effect of Substrate Temperature on Tantalum Carbides Interlayers Synthesized onto WC-Co Substrates for Adherent Diamond Deposition

Study on the Effects of Substrate Grain Size on Diamond Thin Films Deposited on Tungsten Carbide Substrates

Effect of Boron Doping on Diamond Film and Electrochemical Properties of BDD According to Thickness and Morphology

Improvement Of Adhesive Strength And Surface Roughness Of Diamond Films On Co-Cemented Tungsten Carbide Tools

Study on deposition and characterization of diamond coated cylinder-shaped substrate

Effect of Deposition Parameters on Micro- and Nano-Crystalline Diamond Films Growth on WC–Co Substrates by HFCVD

Fabrication and application of high quality diamond-coated tools

Co evolutions for WC–Co with different Co contents during pretreatment and HFCVD diamond film growth processes

Novel conversion annealing pretreatment for improved deposition of diamond coatings onto WC-Co cemented carbide

Effect of Doping Level on Residual Stress, Coating-Substrate Adhesion and Wear Resistance of Boron-Doped Diamond Coated Tools

Interface characteristics of CVD diamond coating on WC-Co cemented carbide substrate

Fabrication and Cutting Performance of Boron-Doped Diamond Coating Inserts

Synthesis of Nanocrystalline Diamond Films on Smooth Wc-Co Cemented Carbide Substrates

The effect of interlayer reactivity on the quality of diamond coating by HFCVD deposition

Deposition and Characterization of Boron-Doped Hfcvd Diamond Films on Ti, Sic, Si and Ta Substrates

Effect of Pressure on the Growth of Boron and Nitrogen Doped HFCVD Diamond Films on WC–Co Substrate