Fabrication-induced Even-Odd Discrepancy of Magnetotransport in Few-Layer MnBi_2Te_4

Yaoxin Li,Yongchao Wang,Zichen Lian,Hao Li,Zhiting Gao,Liangcai Xu,Huan Wang,Rui'e Lu,Longfei Li,Yang Feng,Jinjiang Zhu,Liangyang Liu,Yongqian Wang,Bohan Fu,Shuai Yang,Luyi Yang,Yihua Wang,Tianlong Xia,Chang Liu,Shuang Jia,Yang Wu,Jinsong Zhang,Yayu Wang
DOI: https://doi.org/10.1038/s41467-024-47779-3
IF: 16.6
2024-01-01
Nature Communications
Abstract:The van der Waals antiferromagnetic topological insulator MnBi2Te4 representsa promising platform for exploring the layer-dependent magnetism andtopological states of matter. Recently observed discrepancies between magneticand transport properties have aroused controversies concerning the topologicalnature of MnBi2Te4 in the ground state. In this article, we demonstrate thatfabrication can induce mismatched even-odd layer dependent magnetotransport infew-layer MnBi2Te4. We perform a comprehensive study of the magnetotransportproperties in 6- and 7-septuple-layer MnBi2Te4, and reveal that both even- andodd-number-layer device can show zero Hall plateau phenomena in zero magneticfield. Importantly, a statistical survey of the optical contrast in more than200 MnBi2Te4 flakes reveals that the zero Hall plateau in odd-number-layerdevices arises from the reduction of the effective thickness during thefabrication, a factor that was rarely noticed in previous studies of 2Dmaterials. Our finding not only provides an explanation to the controversiesregarding the discrepancy of the even-odd layer dependent magnetotransport inMnBi2Te4, but also highlights the critical issues concerning the fabricationand characterization of 2D material devices.
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