Impact of multiple abrasive particles on surface properties of SiC: A molecular dynamics simulation study
Yixin Yun,Shujing Wu,Dazhong Wang,Xiangcheng Luo,Xue Li,Yongwei Zhu,Jiapeng Chen
DOI: https://doi.org/10.1016/j.vacuum.2024.113624
IF: 4
2024-09-08
Vacuum
Abstract:During the fixed abrasive polishing of silicon carbide, multiple abrasive particles on the polishing pad mechanically remove material from the workpiece surface. This study employs molecular dynamics simulations to examine the impact of grinding depth and abrasive particle spacing on surface morphology, subsurface damage, structural phase transformation, temperature, and mechanical properties of SiC. The results show that increasing grinding depth shifts the atomic removal mechanism from adhesion and plowing to cutting, while varying particle spacing affects removal efficiency. Subsurface damage, influenced by grinding depth and abrasive size, leads to crack formation due to temperature and stress. Radial distribution functions were used to identify changes in the diamond structure of SiC. Additionally, temperature and force are critical factors, increased grinding depth raises the temperature, and the grinding force of leading particles exceeds that of trailing ones, with larger particle radii causing higher normal forces. These findings offer theoretical guidance for improving the machining quality and performance of SiC workpieces in multi-abrasive particle grinding.
materials science, multidisciplinary,physics, applied