Integrated Assembly and Photopreservation of Topographical Micropatterns (Small 37/2021)
Shuailong Zhang,Weizhen Li,Mohamed Elsayed,Jiaxi Peng,Yujie Chen,Yanfeng Zhang,Yibo Zhang,Moein Shayegannia,Wenkun Dou,Tiancong Wang,Yu Sun,Nazir P. Kherani,Steven L. Neale,Aaron R. Wheeler
DOI: https://doi.org/10.1002/smll.202170193
IF: 13.3
2021-09-01
Small
Abstract:Topographical MicropatternsIn article number 2103702, Aaron R. Wheeler and co-workers introduce a new technique for forming permanent topographical micropatterns, relying on optoelectronic tweezers (OET) and in situ UV photopolymerization. For the first time, an OET system was used to assemble working microcapacitive circuits, and the capacity to preserve these systems in photocured resins (which can be transferred to diverse materials) opens the door for a wide range of applications.
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology