The reflectance of the Al+ MgF2 film in the far-ultraviolet

j wang,j zhang,h jiao,x cheng,z wang

DOI: https://doi.org/10.1364/oic.2019.fb.3

2019-01-01

Abstract:The Al mirror protected with a fluoride film was produced, and the effect of the annealing to the reflectance was investigated. It showed the reflectance >85% in the wavelength of 121.6nm has been achieved.

What problem does this paper attempt to address?

Al mirrors in vacuum ultraviolet region

Fengli Wang,Shuangying Li,Hongjun Zhou,Tonglin Huo,Zhanshan Wang

DOI: https://doi.org/10.1117/12.2537954

2019-11-19

Abstract:Aluminum mirrors with high reflectivity have a wide range of applications in the vacuum ultraviolet, such as for space observation, synchrotron radiation. Due to the oxidation of Al has great effect on the reflectivity below the wavelength of 160 nm, Al-protected mirrors have experienced significant development over the past years, particularly like Al overcoated with LiF, MgF2. This paper focuses on Al mirror over-coated with LiF, MgF2 and LiF+MgF2 in the wavelength range of 105-130 nm. The mirrors are prepared by three steps thermal boat evaporation method. The reflectivity of mirrors in the wavelength range of 105~130 nm is measuring at the National Synchrotron Radiation Laboratory (NSRL) of China, and the structural properties have been analyzed using grazing incidence X-ray reflectometer. Compared the reflectivity of samples placed in the relative humidity of 40%, the reflectivity of Al + LiF mirrors has dropped significantly within 2 months, while the reflectivity of Al+MgF2 mirrors almost has no change within 30 months. The reflectivity of Al +LiF+MgF2 mirrors stored in the relative humidity of 40% performs well within 4 months and we will further study the time stability.
Scratch-resistant Antireflective Coating for Mid-Wave Infrared Band

Zeyu Zhu,Yusi Wang,Yuting Pan,Yu Shao,Junren Wen,Haiqi Gao,Tao Liang,Yuchuan Shao,Weidong Shen,Chenying Yang

DOI: https://doi.org/10.1016/j.infrared.2023.104807

IF: 2.997

2023-01-01

Infrared Physics & Technology

Abstract:In the 3-5 & mu;m mid-wave infrared (MWIR) atmospheric transparency window region, infrared detectors are widely applied in spectral imaging, remote sensing and other fields, and their rapid development has put forward higher requirements for infrared optical windows. Common mid-wave infrared optical materials such as germanium and zinc sulfide have poor mechanical properties, causing them difficult to meet various harsh environments. In this paper, a 3-layer film stack is proposed to achieve high transmission and high hardness by radio-frequency reactive magnetron sputtering with the single aluminum target. Two types of AlN/ Al2O3/AlN stack with top AlN thicknesses of 50 and 100 nm are studied to realize the best optical and mechanical characteristics. The average transmission increases up to 94.0% for 3-5 & mu;m with the double-side AlN/Al2O3/AlN stacks on the silicon substrate, while the hardness is significantly improved to-16.6 GPa for both types. After annealing at 500 degrees C and 750 degrees C for 6 h in a vacuum environment, the spectra of the two film stacks move towards the shorter wavelength slightly, and the hardness of both are obviously enhanced. The highest hardness of the film system reaches-20.8 GPa, making it far more resistant to sand erosion than ordinary antireflection films. The result shows that this film stack can withstand high temperature and gravel impact tests, meeting the service requirements of the harsh environment of the MWIR optical system.
Effect of MgF2 deposition temperature on Al mirrors in vacuum ultraviolet

Fengli Wang,Shuangying Li,Zhuangzhuang Zhang,Zhanshan Wang,Hongjun Zhou,Tonglin Huo

DOI: https://doi.org/10.1117/12.2540004

2019-07-08

Abstract:High reflectivity of mirrors is very important for many applications in the vacuum ultraviolet, such as for space observation, synchrotron radiation. This paper focuses on the substrate temperature’s effect on the performance of Al mirrors when depositing the upper MgF2 layer. Al films are deposited on the substrates at room temperature by thermal evaporation, and a 5 nm MgF2 film is deposited on Al coating at room temperature immediately. Heating the substrate to various temperatures ranging from room temperature to 350, then a 20 nm MgF2 film is deposited on the surface of Al/MgF2. The thickness of each layer is characterized using grazing incidence x-ray reflectivity. The reflectivity of sample is measured at the incident angle of 5 in the wavelength range of 105~130 nm. The reflectivity of all samples fabricated at above room temperature is higher than the sample at room temperature below 115nm. The reflectivity of mirror at 350 temperature is lower than other mirrors, and the reflectivity of the samples at 300 and 200 is similar. There are more black dots on the surface of mirror at 350 than 300, and no black dot on the surface of mirror at 200. The measured results using surface profiler show that the black dots are small holes that increase the roughness of mirror and reduce the reflectivity. So the best temperature for depositing the upper MgF2 layer is in 200~300 to obtain high reflectivity of Al mirrors in vacuum ultraviolet.
Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Yanghui Li,Weidong Shen,Yueguang Zhang,Xiang Hao,Huanhuan Fan,Xu Liu

DOI: https://doi.org/10.3788/col201311.s10205

IF: 2.56

2013-01-01

Chinese Optics Letters

Abstract:Trimethylamine (TMA), TiCl4, and water are applied as the precursors to deposit Al2O3 and TiO2. With different substrate temperatures, the optical properties and surface morphologies of the two oxides TiO2 and SiO2 are studied, respectively. With substrate temperature of 120 oC, amorphous TiO2 can be obtained, and the surface roughness (RMS) is only 0.928 nm. Applying Al2O3 and TiO2 deposited in 120 oC as low and high refractive index materials, anti-reflection (AR) coating at single point (550 nm) is designed. Furthermore, with the calibrated growth rates, this AR coating is fabricated, and its ultimate reflectance for the AR coating at 550 nm is less than 0.2%, which can meet the requirement for most applications.
Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

He Junpeng,Zhang Yueguang,Shen Weidong,Liu Xu,Gu Peifu,何俊鹏 He Junpeng,章岳光 Zhang Yueguang,沈伟东 Shen Weidong,刘旭 Liu Xu,顾培夫 Gu Peifu

DOI: https://doi.org/10.3788/AOS20103001.0277

2010-01-01

Acta Optica Sinica

Abstract:The optical properties of Al2O3 films grown by atomic layer deposition were investigated.Trimethylaluminium(TMA) and water vapour(H2O) were used as the chemical precursors to deposit Al2O3 films on glass substrates at temperature of 250 ℃ and 300 ℃ respectively.Characterization of the films such as optical properties,surface morphological image and microstructure were performed by using spectrophotometer,X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS),scanning electron microscope(SEM) and atomic force microscopy(AFM).The results show that both the as-deposited and annealed A12O3 films are amorphous.The surface roughness is as low as 1.2 nm while the packing densities are larger than 0.97.Al2O3 films by this technique exhibit good optical properties with low absorption in the spectral region from mid-ultraviolet to near-infrared.This study indicates that Al2O3 film deposited by ALD is applicable for optical coatings of the materials with midde and low refractive index.
Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition

John Hennessy,Kunjithapatham Balasubramanian,Christopher S. Moore,April D. Jewell,Shouleh Nikzad,Kevin France,Manuel Quijada

DOI: https://doi.org/10.1117/1.jatis.2.4.041206

2016-06-07

Abstract:Metallic aluminum mirrors remain the best choice for high reflectance applications at ultraviolet wavelengths (90 to 320 nm) and maintain good performance through optical and infrared wavelengths. Transparent protective coatings are required to prevent the formation of an oxide layer, which severely degrades reflectance at wavelengths below 250 nm. We report on the development of atomic layer deposition (ALD) processes for thin protective films of aluminum fluoride that are viable for application at substrate temperatures <200°C. Reflectance measurements of aluminum films evaporated in ultrahigh vacuum conditions, and protected mirrors encapsulated with ALD AlF3 are used to evaluate the far ultraviolet (90 to 190 nm) and near ultraviolet (190 to 320 nm) performance of both the ALD material and the underlying metal. Optical modeling is used to predict the performance of optimized structures for future astronomical mirror applications.

engineering, aerospace,instruments & instrumentation,optics
Oxidation of aluminum thin films protected by ultrathin MgF2 layers measured using spectroscopic ellipsometry and X-ray photoelectron spectroscopy

M. Linford,Brian I. Johnson,R. S. Turley,D. Allred,Tahereh G. Avval

DOI: https://doi.org/10.1364/OSAC.417302

2021-03-15

Abstract:To maintain high, broad-band reflectance, thin transparent fluoride layers, such as MgF2, are used to protect aluminum mirrors against oxidation. In this study, we present, for the first time, combined X-ray photoelectron spectroscopy (XPS) and spectroscopic ellipsometric (SE) studies of aluminum oxidation as a function of MgF2 overlayer thickness (thickness 0-5 nm). Dynamic SE tracks the extent of oxide growth every ca. 2s over a period of several hours after the evaporated Al + MgF2 bilayer is removed from the deposition chamber. Aluminum oxidation changes under the fluoride layer were quantitatively verified with XPS. Changes in chemical state from Al metal to Al oxide were directly observed. Oxide growth is computed from relative XPS peak areas as corrected for electron attenuation through the MgF2 overlayer. An empirical formula fits time-dependent data for aluminum surfaces protected by MgF2 as a function of MgF2 layer thickness: aluminum-oxide thickness = kSE*log(t)+bSE. The slope depends only on MgF2 thickness, decreasing monotonically with increasing MgF2 thickness. This method of employing SE coupled with XPS can be extendable to the study of other metal/overlayer combinations.

Physics,Materials Science
Structural, infrared optical and mechanical properties of the magnesium fluoride films

Peng Sun,Chenghui Jiang,Yugang Jiang,Dandan Liu,Lei Sun,Shijie Dun,Yu Li,Yiqin Ji,Huasong Liu

DOI: https://doi.org/10.1016/j.infrared.2024.105184

IF: 2.997

2024-01-27

Infrared Physics & Technology

Abstract:In this research, the magnesium fluoride (MgF 2 ) films are deposited by electron beam evaporation at different substrate temperatures. The structural, infrared optical properties, mechanical properties and application of the films are investigated. The films prepared at higher temperatures have better crystallinity. As indicated by SEM and AFM, large grains are formed on the film surface at higher temperatures. Preparing thin films at higher temperatures should effectively improve the microstructure with packing density, resulting in higher refractive index and lower moisture absorption. The infrared optical constants of the films are characterized by Gaussian oscillators, and the relationship between the optical absorption and the substrate temperature is revealed. The film deposited at 300 °C exhibits excellent hardness, which is above 9 GPa. The change of residual stress is mainly determined by thermal stress. By depositing MgF 2 films on sapphire substrates, the transmittance of the sapphire is greatly improved in the range of 3 μm–5 μm. Besides, the MgF 2 films are found to be excellent antireflective coatings for infrared optical elements.

optics,physics, applied,instruments & instrumentation
Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets.

Bo-huei Liao,Cheng-chung Lee

DOI: https://doi.org/10.1364/OE.19.007507

IF: 3.8

2011-04-11

Optics Express

Abstract:We introduce an innovative technique for the deposition of fluorine doped oxide (F:Al(2)O(3)) films by DC pulse magnetron sputtering from aluminum targets at room temperature. There was almost no change in transmittance even after the film was exposed to air for two weeks. Its refractive index was around 1.69 and the extinction coefficient was smaller than 1.9 × 10(-4) at 193 nm. An AlF(3)/F:Al(2)O(3) antireflection coating was deposited on both sides of a quartz substrate. A high transmittance of 99.32% was attained at the 193 nm wavelength. The cross-sectional morphology showed that the surface of the multilayer films was smooth and there were no columnar or porous structures.

Medicine,Materials Science,Physics
Ultrathin protective coatings by atomic layer engineering for far ultraviolet aluminum mirrors

John Hennessy,April D. Jewell,Christopher S. Moore,Alexander G. Carver,Kunjithapatham Balasubramanian,Kevin France,Shouleh Nikzad,Kevin C. France

DOI: https://doi.org/10.1117/12.2314185

2018-07-06

Abstract:Conventional aluminum-coated mirrors operating at far ultraviolet wavelengths (90–200 nm) utilize protective overcoats of metal fluoride thin films deposited by physical vapor deposition. The use of atomic layer deposition (ALD) holds promise in improving spatial reflectance uniformity and reducing the required thickness of the protective layers. Achieving a stable, pinhole-free, ultrathin (<3 nm) overcoat would allow protected Al mirrors to approach the ideal Al intrinsic reflectivity in the challenging, but spectrally-rich, 90–115 nm range. However, combining ALD methods with high performance evaporated Al layers has technical challenges associated with the formation of undesirable interfacial oxide. To overcome this issue, we demonstrate the use of thermal atomic layer etching (ALE) methods to remove this oxide prior to ALD encapsulation. This paper describes our continuing work to optimize new ALD processes for the metal fluoride materials of MgF2, AlF3 and LiF. We also describe new work on low temperature (<200 °C) ALE methods utilizing a fluorination-volatilization approach that has been incorporated into our mirror development efforts. The scalability of this overall approach and the environmental stability of ALD/ALE Al mirrors is discussed in the context of possible future astrophysics applications such as the NASA LUVOIR and HabEx mission concepts. The use of this combined ALE/ALD method may also enable a fabrication platform in space that can renew or reconfigure protective overcoats on Al mirrors on-orbit, as an alternative to other space-based metal coating methods considered previously.
Preparation of Wide Optical Spectrum and High Antireflection MgF2 Thin Film with SF6 As Reactive Gas

Changjiang Zhao,Chao Ma,Juncheng Liu,Zhigang Liu,Yan Chen

DOI: https://doi.org/10.1088/2053-1591/ab7402

IF: 2.025

2020-01-01

Materials Research Express

Abstract:In order to suppress F-deficiency, SF6 was added into the working gas Ar2 as the reaction gas to deposit MgF2 thin film on quartz glass substrate with radio frequency (RF) magnetron sputtering, and the effects of working pressure on the chemical compositions, microstructure and property of MgF2 thin film were investigated. The results show that with the working pressure increase from 1.0 to 2.5 Pa, the atomic ratio of F: Mg decreased continuously, and reached 2.02 at 2.0 Pa, very close to the ideal stoichiometric ratio of 2:1; the crystallinity of MgF2 film improved first then decreased, and finally changed into amorphous state; the particles’ profile of MgF2 film became clearer and their size increased significantly at first, but finally their profile became blurred. The refractive index of MgF2 film decreased first and then increased, and got the lowest value at 2.0 Pa, 1.384, almost equal to that of MgF2 bulk crystal. The transmittance of the coated glass within 300–1100 nm (hereinafter referred to as the transmittance of the thin film) increased first and then decreased. The transmittance of all films was higher than that of the bare glass substrate (93.2%), that is to say, all films had antireflection effect. The film transmittance reached 94.99% at 2.0 Pa, higher than that of the bare glass substrate by 1.79%, and higher than the simulated value calculated with G-Solver software by about 0.5%.
The enhancement in microstructure, optical and electromagnetic shielding properties of Al-doped Ag thin films by annealing treatment

Danping Wang,Erwei Cheng,Zhaoming Qu,Yingying Wang,Qingguo Wang

DOI: https://doi.org/10.1016/j.surfin.2024.105172

IF: 6.2

2024-10-01

Surfaces and Interfaces

Abstract:Ag thin films having attractive optical transmittance and effective shielding capability are usually used as a preferred choice for the transparent electromagnetic shielding windows. Whereas, the Ag films are grown primarily via an island growth (Volmer-Weber) mechanism, which greatly restricts its application. In this study, by introducing Al atoms and suitable annealing treatment, the continuous and smooth Ag thin films are successfully fabricated by magnetron co-sputtering method. The effect of annealing temperature on the microstructure, optical and electromagnetic shielding properties of the films are conducted the comprehensive and profound study. Our results indicate that the 5 mol% Al-Ag thin film annealed at 200 °C could transform into planar growth structure, and display excellent the highest optical transmittance 89.15 % at 550 nm. Meanwhile, the shielding effectiveness (SE) reaches a peak value of 28.1 dB. 500 °C is estimated as the threshold annealing temperature of Al-Ag thin film with comprehensive performances gradually declining. Moreover, the Al dopants significantly improve the thermal stability of Ag thin films than that of the pure Ag films. These findings are of important guidance for the preparation of high-quality Al-Ag thin films to meet the practical applications.

chemistry, physical,physics, applied, condensed matter,materials science, coatings & films
High Optical Transmittance of Aluminum Ultrathin Film with Hexagonal Nanohole Arrays As Transparent Electrode.

Qing Guo Du,Weisheng Yue,Zhihong Wang,Wah Tung Lau,Hengjiang Ren,Er-Ping Li

DOI: https://doi.org/10.1364/oe.24.004680

IF: 3.8

2016-01-01

Optics Express

Abstract:We fabricate samples of aluminum ultrathin films with hexagonal nanohole arrays and characterize the transmission performance. High optical transmittance larger than 60% over a broad wavelength range from 430 nm to 750 nm is attained experimentally. The Fano-type resonance of the excited surface plasmon plaritons and the directly transmitted light attribute to both of the broadband transmission enhancement and the transmission suppression dips.
Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition

Yuma Sugai,Hironori Sugata,Takuya Sugawara,Safdar Muhammad,Jani Hämäläinen,Nina Lamminmäki,Juhana Kostamo

DOI: https://doi.org/10.1007/s10043-024-00867-7

IF: 1.2

2024-03-04

Optical Review

Abstract:Magnesium fluoride (MgF 2 ) thin films deposited using atomic layer deposition (ALD) were studied for use as optical coatings, meta-surface anti-reflection layer, and chemically resistive passivation. The deposition was performed in a commercially available Picosun® R-200 Advanced ALD reactor. Characterization of composition, density, optical property, chemical resistivity and coverage were performed. ALD-deposited films showed high R + T at wavelength down to 350 nm, excellent 3D coverage, and high chemical resistivity. This technology enables unique properties to improve 3D structured optics such as metasurface.

optics
Optical properties of amorphous Al2O3 thin films prepared by a sol–gel process

Baofu Hu,Manwen Yao,Ruihua Xiao,Jianwen Chen,Xi Yao

DOI: https://doi.org/10.1016/j.ceramint.2014.05.148

IF: 5.532

2014-01-01

Ceramics International

Abstract:Using Al(NO3)3·9H2O as a precursor, optically transparent Al2O3 thin films have been successfully synthesized by combining a sol–gel spin-coating process with one of two different annealing methods. One set of samples was subjected to a conventional annealing process (C.A) at 700°C for 2h in a muffle furnace, while the other set was exposed to a microwave annealing process (M.A) at 700°C for 30min in a microwave oven at 2.45GHz. The structure, morphology, composition, stoichiometry, chemical bonding and optical properties of the films were investigated by X-ray diffractometer (XRD), field emission scanning electron microscopy (FESEM), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and UV–vis–NIR spectrophotometry. XRD, FTIR and XPS investigations confirm that both the C.A and M.A films consist of amorphous Al2O3 with a certain amount of chemisorbed oxygen, and both Al2O3 films have a transmittance of at least 92% in the wavelength range of 400–1200nm. However, compared to the C.A film, the M.A films have an even higher transmittance, a wider optical band gap and a lower refractive index.
Influence of Annealing on the Surface Topography of MgF2: an Atomic Force Microscopic Study

YH Ye,N Gu,HQ Zhang,PP Chen,XL Tan

DOI: https://doi.org/10.1016/s0040-6090(98)01769-6

IF: 2.1

1999-01-01

Thin Solid Films

Abstract:By using an atomic force microscope, the influence of annealing on the surface topography of MgF2 films was studied. Hole growth and column coalescence were observed in the annealed films, and the coalescence process is very rapid. It was found that both the initial structure of the as-deposited films and the annealing temperature play important roles in the evolution of the surface topography of the thin films during the annealing process. The annealing process has a significant effect on the optical properties of the films.
Design and Deposition of Infrared Antireflection Protection Film on Magnesium Fluoride Substrate for 3~5 Μm

Li Lin,Wang Dao-Xing,Fu Xiu-Hua,Liu Dong-Mei,Kou Yang

DOI: https://doi.org/10.4028/www.scientific.net/kem.609-610.94

2014-01-01

Key Engineering Materials

Abstract:The infrared antireflection protection film is designed and deposited on magnesium fluoride substrate for 3~5 μm. The multilayer antireflection film is designed and prepared by ion beam assisted electron-beam deposition. After repeated experiments, the absorption peak of SiO2 is found at 3000nm,using MgF2 and SiO2 as the low-index materials to reduce the absorption. The coating structure is Sub|1.46H1.37L2.19H1.45L2.49M|Air. DLC (diamond-like carbon) protection coating is deposited by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD). Through contrast tests, the best deposition process is obtained (the butane flow rate is 5sccm/s, deposition temperature is 80°C) by setting deposition time as invariant, the reaction gas flow rate and deposition temperature as variables. Meanwhile the problem of associativity between antireflection film and DLC protection coating is solved by adding a Si transition layer. The result shows that the average transmittance of this film in 3~5μm is 95.5%, and this film can withstands harsh environment tests. Key words: Magnesium fluoride substrate; Antireflection protection film; 3~5 μm infrared band Document Code: A Article ID: DIO
Preparation Of Alpha-Al2o3 Thin Films By Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition And Heat Annealing

D. Yu,Y. F. Lu,N. Xu,J. Sun,Z. F. Ying,J. D. Wu

DOI: https://doi.org/10.1116/1.2899569

2008-01-01

Abstract:Optically transparent alpha-Al2O3 thin films were prepared on Si(100) substrates by electron cyclotron resonance (ECR) plasma-assisted pulsed laser deposition followed by heat annealing. Oxygen plasma produced through ECR microwave discharge was used to assist reactive deposition of amorphous aluminum oxide thin films from metallic aluminum and the deposited films were then annealed in air at temperatures ranging from 500 to 1100 degrees C. The as-deposited and heat-annealed films were characterized by Fourier transform infrared spectroscopy, Raman spectroscopy, and X-ray diffraction analysis. The as-deposited films exhibit an amorphous structure, undergo a phase transition upon heat annealing, and convert to alpha form of Al2O3 with rhombohedral crystalline structure after annealing at 1100 degrees C. A SiO2 layer is also found to form between the aluminum oxide film and the Si substrate after the samples were annealed above 700 degrees C. Optical characterization reveals that aluminum oxide films deposited on sapphire substrates under the same deposition conditions are transparent from ultraviolet to near-infrared regions, and the transparency increases over 10% for the alpha-Al2O3 films crystallized through annealing at 1100 degrees C as compared with that of the as-deposited films. (c) 2008 American Vacuum Society.
Preparation of α- Al2 O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing

Dan Yu,Yongfeng Lu,Ningsheng Xu,Jian Sun,Zhifeng Ying,Jiada Wu

DOI: https://doi.org/10.1116/1.2899569

2008-01-01

Abstract:Optically transparent alpha-Al2O3 thin films were prepared on Si(100) substrates by electron cyclotron resonance (ECR) plasma-assisted pulsed laser deposition followed by heat annealing. Oxygen plasma produced through ECR microwave discharge was used to assist reactive deposition of amorphous aluminum oxide thin films from metallic aluminum and the deposited films were then annealed in air at temperatures ranging from 500 to 1100 degrees C. The as-deposited and heat-annealed films were characterized by Fourier transform infrared spectroscopy, Raman spectroscopy, and X-ray diffraction analysis. The as-deposited films exhibit an amorphous structure, undergo a phase transition upon heat annealing, and convert to alpha form of Al2O3 with rhombohedral crystalline structure after annealing at 1100 degrees C. A SiO2 layer is also found to form between the aluminum oxide film and the Si substrate after the samples were annealed above 700 degrees C. Optical characterization reveals that aluminum oxide films deposited on sapphire substrates under the same deposition conditions are transparent from ultraviolet to near-infrared regions, and the transparency increases over 10% for the alpha-Al2O3 films crystallized through annealing at 1100 degrees C as compared with that of the as-deposited films. (c) 2008 American Vacuum Society.
Nanoporous Aluminum-Magnesium Alloy for UV enhanced spectroscopy

Paolo Ponzellini,Giorgia Giovannini,Sandro Cattarin,Remo Proietti Zaccaria,Sergio Marras,Mirko Prato,Andrea Schirato,Francesco D Amico,Eugenio Calandrini,Francesco De Angelis,Wei Yang,Hai-Jun Jin,Alessandro Alabastri,Denis Garoli

DOI: https://doi.org/10.48550/arXiv.1905.09489

2019-05-23

Abstract:We report the first preparation of nanoporous Al-Mg alloy films by selective dissolution of Mg from a Mg-rich AlxMg1-x alloy. We show how to tune the stoichiometry, the porosity and the oxide contents in the final film by modulating the starting ratio between Al and Mg and the dealloying procedure. The obtained porous metal can be exploited for enhanced UV spectroscopy. In this respect, we experimentally demonstrate its efficacy in enhancing fluorescence and surface Raman scattering for excitation wavelengths of 360 nm and 257 nm respectively. Finally, we numerically show the superior performance of the nanoporous Al-Mg alloy in the UV range when compared to equivalent porous gold structures. The large area to surface ratio provided by this material make it a promising platform for a wide range of applications in UV/deep-UV plasmonics.

Applied Physics

The reflectance of the Al+ MgF2 film in the far-ultraviolet

Al mirrors in vacuum ultraviolet region

Scratch-resistant Antireflective Coating for Mid-Wave Infrared Band

Effect of MgF2 deposition temperature on Al mirrors in vacuum ultraviolet

Anti-reflection Coating at 550 Nm Fabricated by Atomic Layer Deposition

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Performance and prospects of far ultraviolet aluminum mirrors protected by atomic layer deposition

Oxidation of aluminum thin films protected by ultrathin MgF2 layers measured using spectroscopic ellipsometry and X-ray photoelectron spectroscopy

Structural, infrared optical and mechanical properties of the magnesium fluoride films

Antireflection coatings for deep ultraviolet optics deposited by magnetron sputtering from Al targets.

Ultrathin protective coatings by atomic layer engineering for far ultraviolet aluminum mirrors

Preparation of Wide Optical Spectrum and High Antireflection MgF2 Thin Film with SF6 As Reactive Gas

The enhancement in microstructure, optical and electromagnetic shielding properties of Al-doped Ag thin films by annealing treatment

High Optical Transmittance of Aluminum Ultrathin Film with Hexagonal Nanohole Arrays As Transparent Electrode.

Optical, chemical and coverage properties of magnesium fluoride formed by atomic layer deposition

Optical properties of amorphous Al2O3 thin films prepared by a sol–gel process

Influence of Annealing on the Surface Topography of MgF2: an Atomic Force Microscopic Study

Design and Deposition of Infrared Antireflection Protection Film on Magnesium Fluoride Substrate for 3~5 Μm

Preparation Of Alpha-Al2o3 Thin Films By Electron Cyclotron Resonance Plasma-Assisted Pulsed Laser Deposition And Heat Annealing

Preparation of α- Al2 O3 thin films by electron cyclotron resonance plasma-assisted pulsed laser deposition and heat annealing

Nanoporous Aluminum-Magnesium Alloy for UV enhanced spectroscopy