Electrically Tunable Wafer-Sized Three-Dimensional Topological Insulator Thin Films Grown by Magnetron Sputtering
Qixun Guo,Yu Wu,Longxiang Xu,Yan Gong,Yunbo Ou,Yang Liu,Leilei Li,Yu Yan,Gang Han,Dongwei Wang,Lihua Wang,Shibing Long,Bowei Zhang,Xun Cao,Shanwu Yang,Xuemin Wang,Yizhong Huang,Tao Liu,Guanghua Yu,Ke He,Jiao Teng
DOI: https://doi.org/10.1088/0256-307x/37/5/057301
2020-01-01
Abstract:Three-dimensional (3D) topological insulators (TIs) are candidate materials for various electronic and spintronic devices due to their strong spin-orbit coupling and unique surface electronic structure. Rapid, low-cost preparation of large-area TI thin films compatible with conventional semiconductor technology is the key to the practical applications of TIs. Here we show that wafer-sized Bi2Te3 family TI and magnetic TI films with decent quality and well-controlled composition and properties can be prepared on amorphous SiO2/Si substrates by magnetron cosputtering. The SiO2/Si substrates enable us to electrically tune (Bi1-xSbx)(2)Te-3 and Cr-doped (Bi1-xSbx)(2)Te-3 TI films between p-type and n-type behavior and thus study the phenomena associated with topological surface states, such as the quantum anomalous Hall effect (QAHE). This work significantly facilitates the fabrication of TI-based devices for electronic and spintronic applications.