Microstructure and misfit relaxation in SrTiO 3 /SrRuO 3 bilayer films on LaAlO 3 (100) substrates

J. S. Wu,C. L. Jia,K. Urban,J. H. Hao,X. X. Xi
DOI: https://doi.org/10.1557/JMR.2001.0473
IF: 2.7
2011-01-01
Journal of Materials Research
Abstract:We studied the microstructure of SrTiO 3 /SrRuO 3 bilayer films on (001) LaAlO 3 substrates by high-resolution transmission electron microscopy. At the SrRuO 3 /LaAlO 3 interface a defect configuration of stacking faults and nanotwins bounding either Frank partial dislocations or Shockley partial dislocations and complex interaction between these planar defects were found to be the dominant means of misfit accommodation. The misfit in the SrTiO 3 /SrRuO 3 system, however, is mainly accommodated by elastic strain. Most of the observed defects in the SrTiO 3 layer can be related to the [111] planar defects in the SrRuO 3 layer propagating and reaching the SrTiO 3 /SrRuO 3 interface. Furthermore, a [110] planar defect can also be introduced in the SrTiO 3 layer due to the structure change of the SrTiO 3 /SrRuO 3 interface.
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