Resistance Minimum Observed at Landau Level Filling Factorν=1/2in Ultra High Magnetic Fields

Jian Zhang,R. R. Du,J. A. Simmons,J. L. Reno
DOI: https://doi.org/10.1103/physrevb.81.041308
2010-01-01
Abstract:We study the magnetotransport near Landau level filling factor $\ensuremath{\nu}=1/2$ in a gated GaAs-${\text{Al}}_{0.3}{\text{Ga}}_{0.7}\text{As}$ square quantum well (width 35 nm) in magnetic field up to 45 T and in a temperature $(T)$ range between 50 mK and 1.5 K. The longitudinal resistance at $\ensuremath{\nu}=1/2$, ${R}_{xx}(\ensuremath{\nu}=1/2)$, exhibits a steep valley that is flanked by a pair of rising resistance peaks in low $T$. The ${R}_{xx}(\ensuremath{\nu}=1/2)$ shows nonmonotonous dependence on $T$, with a minimum resistance reached at $T\ensuremath{\sim}0.5\text{ }\text{K}$. The concomitant Hall resistance ${R}_{xy}$ is not strictly linear with magnetic field and its slope shows a sharp cusp at $\ensuremath{\nu}=1/2$, indicating a nonclassical Hall effect. The data are characteristic for ultra high field magnetotransport around $\ensuremath{\nu}=1/2$ in thick, but single-layer, quantum wells.
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