Ultrasonic Spray Pyrolysis‐assisted Fabrication of Ultrathin CuWO4 Films with Improved Photoelectrochemical Performance

Xiaoyu Duan,Chong Xu,Amany M. El Nahrawy,Jing Chen,Zhiqiang Zhu,Jianmin Wang,Qinghua Liang,Feng Cao
DOI: https://doi.org/10.1002/cnma.202100419
IF: 3.82
2021-01-01
ChemNanoMat
Abstract:CuWO4 is a promising n-type oxide semiconductor for photoelectrochemical (PEC) applications due to the suitable band gap and good photochemical stability. An easy and large-scale fabrication of ultrathin CuWO4 films with improved PEC performance is highly desired for future practical application but still challenging. Considering that the ultrasonic spray pyrolysis approach is a low-cost and scalable technique for fabricating films with controllable thickness, we here report the controllable fabrication of ultrathin CuWO4 films with improved PEC performance by an automatic ultrasonic spray pyrolysis method. The effects of different tungsten sources and film thickness on the PEC performance of the resultant CuWO4 film were studied in detail. We find that the ultrathin CuWO4 film prepared from the ammonium metatungstate with a thickness of 2.16 mu m shows the best PEC performance of 41 mu A cm(-2) at 1.23 V vs.RHE for water oxidation under visible light irradiation. We also explored the different charge transfer mechanism and PEC performance of the resultant CuWO4 films under back and front illumination.
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