Demonstration of Double-Pass Amplification of Gain Saturated 46.9 Nm Laser

Yongpeng Zhao,Dongdi Zhao,Bo An,Lei Li,Yunsong Bai,Huaiyu Cui
DOI: https://doi.org/10.1016/j.optcom.2021.127571
IF: 2.4
2022-01-01
Optics Communications
Abstract:With a SiC plane mirror, we demonstrated the double-pass amplification of gain saturated 46.9 nm laser pumped by capillary discharge. In comparison with the single-pass amplified 46.9 nm laser, the amplitude of the double-pass laser pulse increased about 2.4 times, and the FHWM of the double-pass laser pulse broadened about 0.9 ns. In addition, the single-pass and the double-pass amplified laser spots have similar spatial distributions and peak-to-peak divergences. The double-pass 46.9 nm laser has good practicability because the SiC mirror is hardly damaged by the plasma.
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