Pack Deposition Of Oxidation Resistant Silicide And Aluminide Coatings On Gamma-Tial

Zd Xiang,S Rose,Pk Datta
2002-01-01
Abstract:Thermochemical analyses were undertaken for a series of pack powder mixtures for co-depositing Al and Si to form silicide and aluminide diffusion coatings on gamma-TiAl by the pack cementation process. Based on the results obtained, experimental studies were carried out to identify optimum pack powder mixtures and conditions for the co-deposition process. The thermochemical calculation results suggested that co-deposition of Al and Si is possible with CrCl3 (.) 6H(2)O and AlCl3 activated packs containing elemental Al and Si as depositing sources. But, experimental results obtained at 1100degreesC revealed that CrCl3 (.) 6H(2)O is not a suitable activator for the co-depositing process. It caused a significant degree of degradation to the substrate indicated by the specimen weight losses. However, pack powder mixtures activated by AlCl3 were successfully used to co-deposit At and Si to form diffusion coatings on gamma-TiAl at 1100degreesC. The coatings produced had a multi-layered structure consisting of an outer silicide layer, an inner aluminide layer of TiAl3 and a transitional layer at the boundary between the deposited coating and the substrate. It is suggested that such coatings were formed via a sequential deposition mechanism through inward diffusion of aluminium and silicon. A discussion is presented on the parameters that need to be effectively controlled to ensure the co-deposition of Si and Al to form silicide and aluminide diffusion coatings on gamma-TiAl with a coherent structure free from microcracking and spallation by the pack cementation process.
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