Nanostructural Thin Film Development with Chemical Solution Deposition

Yanda Ji,Yuan Lin
DOI: https://doi.org/10.1002/9783527696406.ch8
2016-01-01
Abstract:Among the well-developed deposition techniques, chemical solution deposition (CSD) is noted for its easy setup, low cost, and the ability of coating on irregular surfaces. In principle, a CSD technique is based on the hydrothermal or solvothermal mechanism, and the structural and physical properties of the final products can be optimized by controlling the parameters of the process from liquid phase to solid phase. Usually, a typical CSD process for thin film deposition includes three steps: precursor solution preparation, surface coating, and thermal treatment. This chapter describes these three steps. According to the different routes to form the precursor solutions, the CSD techniques can be divided into sol-gel method, metal-organic deposition (MOD), and some other techniques such as newly developed polymer-assisted deposition (PAD). Compared to other conventional CSD techniques, polymer-assisted deposition (PAD) uses water-soluble polymers in the solution.
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